Methacrylic Acid

Methacrylic Acid

SCHEMBL7518017

C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.CC(=CO)C(=O)O

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.36
PTGS1 P23219 1/20 0.34
AKR1C3 P42330 1/20 0.34
ALDH1A1 P00352 2/20 0.32
FFAR3 O14843 1/20 0.32
LCK P06239 1/20 0.32
FYN P06241 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8302855 0.88
SCHEMBL34404 0.88
SCHEMBL149416 0.88
SCHEMBL8935075 0.85
Acrylic Acid SCHEMBL8603343 0.81 LMNA (0.53) PTGS1AKR1C3ALDH1A1FFAR3LCK
Methacrylic Acid SCHEMBL152434 0.80 TDP1 (0.38) TDP1PTGS1AKR1C3ALDH1A1FFAR3
Methacrylic Acid SCHEMBL121822 0.80 TDP1 (0.38) TDP1PTGS1AKR1C3ALDH1A1FFAR3
Methacrylic Acid SCHEMBL15646355 0.80 TDP1 (0.38) TDP1PTGS1AKR1C3ALDH1A1FFAR3
Methacrylic Acid SCHEMBL6212085 0.80 TDP1 (0.38) TDP1PTGS1AKR1C3ALDH1A1FFAR3
Methacrylic Acid SCHEMBL5391202 0.79 TDP1 (0.42) TDP1ALDH1A1FFAR3LCKFYN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0716102-B1 TRANSPARENT PLASTIC MATERIAL, OPTICAL ARTICLE MADE THEREFROM, AND PRODUCTION PROCESS SEIKO EPSON CORP (JP) 2002-02-06 EP claimed
EP-0407004-B1 Radiation-curable matrix material, optical fiber ribbons containing same; and process for preparing said optical fiber ribbons BORDEN INC (US) 1996-08-14 EP claimed
EP-0334051-B1 Electron beam-curable composition for release material and process for preparation of release material SHOWA DENKO KK (JP) 1996-05-01 EP claimed
US-5206092-A Irradiating a composition of polyolefin resin, dimethylsiloxane and a polyfunctional compound having unsaturation or thiol groups SHOWA DENKO K.K. (JP) 1993-04-27 US claimed
EP-3330329-B1 INKJET RECORDING APPARATUS, PRINTER, AND METHOD FOR MANUFACTURING CURED PRODUCT RICOH CO LTD (JP) 2022-06-08 EP disclosed
US-10710374-B2 Inkjet recording apparatus, printer, and method for manufacturing cured product RICOH COMPANY, LTD. (JP) 2020-07-14 US disclosed
US-20200086652-A1 INKJET RECORDING APPARATUS, PRINTER, AND METHOD FOR MANUFACTURING CURED PRODUCT IIO MASATO (JP) 2020-03-19 US disclosed
US-10538099-B2 Inkjet recording apparatus, printer, and method for manufacturing cured product RICOH COMPANY, LTD. (JP) 2020-01-21 US disclosed
US-20180154657-A1 INKJET RECORDING APPARATUS, PRINTER, AND METHOD FOR MANUFACTURING CURED PRODUCT RICOH COMPANY, LTD. (JP) 2018-06-07 US disclosed
EP-3330329-A2 INKJET RECORDING APPARATUS, PRINTER, AND METHOD FOR MANUFACTURING CURED PRODUCT Ricoh Company Ltd. (JP) 2018-06-06 EP disclosed
EP-3243845-A1 ACTIVE ENERGY RAY CURABLE COMPOSITION, CURED PRODUCT, COMPOSITION STORAGE CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, AND TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD Ricoh Company, Ltd. (JP) 2017-11-15 EP disclosed
US-9612065-B2 Heat conductive sheet 3M INNOVATIVE PROPERTIES COMPANY (US) 2017-04-04 US disclosed
EP-0334051-B1 Electron beam-curable composition for release material and process for preparation of release material SHOWA DENKO KK (JP) 1996-05-01 EP disclosed
US-5206092-A Irradiating a composition of polyolefin resin, dimethylsiloxane and a polyfunctional compound having unsaturation or thiol groups SHOWA DENKO K.K. (JP) 1993-04-27 US disclosed
EP-0334051-A2 Electron beam-curable composition for release material and process for preparation of release material SHOWA DENKO KABUSHIKI KAISHA (JP) 1989-09-27 EP disclosed