Phthalic Acid

Phthalic Acid

SCHEMBL7519717

O=C([O-])c1ccccc1C(=O)[O-].[Rb+].[Rb+]

nearest known ligand 0.64

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.64
▸ KDM4E B2RXH2 4/20 0.64
▸ HPGD P15428 3/20 0.64
▸ CA2 P00918 2/20 0.50
▸ CA4 P22748 2/20 0.50
▸ ALOX15 P16050 2/20 0.50
▸ NFKB1 P19838 1/20 0.43
▸ MAPK1 P28482 1/20 0.43
▸ CYP2C19 P33261 1/20 0.43
▸ BLM P54132 1/20 0.43
▸ CES2 O00748 3/20 0.42
▸ CES1 P23141 3/20 0.42
▸ CA12 O43570 1/20 0.42
▸ CA1 P00915 1/20 0.42
▸ HMGB1 P09429 1/20 0.42
▸ CA6 P23280 1/20 0.42
▸ CA7 P43166 1/20 0.42
▸ SMN1; SMN2 Q16637 1/20 0.42
▸ CA9 Q16790 1/20 0.42
▸ NAPRT Q6XQN6 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phthalic Acid SCHEMBL7518819 0.97 ALDH1A1 (0.61) ALDH1A1KDM4EHPGDCA2CA4
Phthalic Acid SCHEMBL5604206 0.94 ALDH1A1 (0.64) ALDH1A1KDM4EHPGDCA2CA4
Phthalic Acid SCHEMBL4351658 0.94 ALDH1A1 (0.64) ALDH1A1KDM4EHPGDCA2CA4
Phthalic Acid SCHEMBL4445698 0.94 ALDH1A1 (0.64) ALDH1A1KDM4EHPGDCA2CA4
Phthalic Acid SCHEMBL109123 0.94 ALDH1A1 (0.64) ALDH1A1KDM4EHPGDCA2CA4
Phthalic Acid SCHEMBL848649 0.94 ALDH1A1 (0.64) ALDH1A1KDM4EHPGDCA2CA4
Phthalic Acid SCHEMBL18730184 0.94 ALDH1A1 (0.64) ALDH1A1KDM4EHPGDCA2CA4
Phthalic Acid SCHEMBL4351659 0.94 ALDH1A1 (0.64) ALDH1A1KDM4EHPGDCA2CA4
Phthalic Acid SCHEMBL8736349 0.94 ALDH1A1 (0.64) ALDH1A1KDM4EHPGDCA2CA4
Phthalic Acid SCHEMBL1319085 0.94 ALDH1A1 (0.64) ALDH1A1KDM4EHPGDCA2CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119280450-A Medical fabric dressing with long-acting disinfection and sterilization functions and preparation method thereof 孙国明 2025-01-10 — — CN claimed
CN-118844836-A Long-acting disinfection and sterilization wet (towel) paper 孙国明 2024-10-29 — — CN claimed
CN-118844448-A Preparation method of long-acting antibacterial liquid 孙国明 2024-10-29 — — CN claimed
CN-115433376-A Preparation method of long-acting disinfection and sterilization fabric or fiber 孙国明 2022-12-06 — — CN claimed
WO-2025110145-A1 SILICON-CARBIDE-BASED CERAMIC HONEYCOMB STRUCTURE 株式会社プロテリアル 2025-05-30 — — WO disclosed
US-12308146-B2 Multilayer varistor PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2025-05-20 — — US disclosed
CN-119280450-A Medical fabric dressing with long-acting disinfection and sterilization functions and preparation method thereof 孙国明 2025-01-10 — — CN disclosed
CN-119234144-A Correction method, analysis device, and program 株式会社岛津制作所 2024-12-31 — — CN disclosed
CN-118844836-A Long-acting disinfection and sterilization wet (towel) paper 孙国明 2024-10-29 — — CN disclosed
CN-118844448-A Preparation method of long-acting antibacterial liquid 孙国明 2024-10-29 — — CN disclosed
WO-2023223777-A1 CORRECTION METHOD, ANALYZER, AND PROGRAM 株式会社島津製作所 2023-11-23 — — WO disclosed
US-20230207159-A1 MULTILAYER VARISTOR PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2023-06-29 — — US disclosed
CN-116344132-A Multilayer piezoresistor 松下知识产权经营株式会社 2023-06-27 — — CN disclosed
CN-115433376-A Preparation method of long-acting disinfection and sterilization fabric or fiber 孙国明 2022-12-06 — — CN disclosed
US-6472079-B2 PRODUCT OF HYDROLYSIS AND CONDENSATION OF AN ORGANOSILICON COMPOUND; 1A OR 2A COMPOUND, ESPECIALLY CARBOXYLIC SALT; SOLVENT; EXCELLENT CRACKING RESISTANCE AFTER A PCT (PRESSURE COOKER TEST). JSR CORPORATION (JP) 2002-10-29 — — US disclosed
US-20020045693-A1 Composition for film formation, method of film formation and silica-based film JSR CORPORATION (JP) 2002-04-18 — — US disclosed
EP-1148105-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-10-24 — — EP disclosed
US-4803152-A Silver halide photographic material containing novel chloride content FUJI PHOTO FILM CO., LTD. (JP) 1989-02-07 — — US disclosed
US-4728602-A SILVERIODOBROMIDE PARTICLES HAVING LESS SILVER IODIDE IN SHELL THAN IN CORE FUJI PHOTO FILM CO., LTD. (JP) 1988-03-01 — — US disclosed
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