SCHEMBL7520964

SCHEMBL7520964

CC[SiH](CC)C1CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.36
CYP1A2 P05177 1/20 0.35
ADH1C P00326 1/20 0.30
ADH1A P07327 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12490373 0.97 SHBG (0.32) SHBGCYP1A2
SCHEMBL15914614 0.78 CYP1A2 (0.37) SHBGCYP1A2ADH1A
SCHEMBL3887309 0.77 SHBG (0.36) SHBGCYP1A2ADH1CADH1A
SCHEMBL2734204 0.74 SHBG (0.35) SHBGCYP1A2
SCHEMBL15914519 0.74 CYP1A2 (0.33) CYP1A2
SCHEMBL3301595 0.74 CYP1A2 (0.44) SHBGCYP1A2
SCHEMBL15915004 0.73 SHBG (0.32) SHBGCYP1A2
SCHEMBL28243783 0.72 SHBG (0.33) SHBGCYP1A2
SCHEMBL9011816 0.72 SHBG (0.33) SHBGCYP1A2
SCHEMBL15915021 0.71 CYP1A2 (0.41) CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
CN-103781937-B Filmogen, the diaphragm seal using the filmogen, and application thereof 东曹株式会社 2017-05-31 CN disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed
CN-103781937-A Film-forming material, sealing film using same, and use of sealing film TOSOH CORP 2014-05-07 CN disclosed
CN-103154007-A Anthra[2,3-b:7,6b']dithiophene derivatives and their use as organic semiconductors MERCK PATENT GMBH 2013-06-12 CN disclosed
EP-1173446-A1 METHOD FOR PREPARING TRIORGANYL HALOGEN SILANES AND DIORGANYL DIHALOGEN SILANES Wacker-Chemie GmbH (DE) 2002-01-23 EP disclosed
WO-2000064909-A1 METHOD FOR PREPARING TRIORGANYL HALOGEN SILANES AND DIORGANYL DIHALOGEN SILANES WACKER-CHEMIE GMBH (DE) 2000-11-02 WO disclosed