Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | CES2 | O00748 | 3/20 | 0.41 |
| ▸ | CES1 | P23141 | 3/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | DAO | P14920 | 1/20 | 0.41 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | GFER | P55789 | 1/20 | 0.40 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.39 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.39 |
| ▸ | GSK3B | P49841 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | F2 | P00734 | 1/20 | 0.38 |
| ▸ | F10 | P00742 | 1/20 | 0.38 |
| ▸ | F12 | P00748 | 1/20 | 0.38 |
| ▸ | F7 | P08709 | 1/20 | 0.38 |
| ▸ | F3 | P13726 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3272106 | 0.75 | ALDH1A1 (0.52) | ALDH1A1CES2CES1TSHRDAO | |
| SCHEMBL27961040 | 0.73 | HPGD (0.64) | ALDH1A1CES2CES1TSHRDAO | |
| SCHEMBL273196 | 0.73 | HPGD (0.64) | ALDH1A1CES2CES1TSHRDAO | |
| SCHEMBL1141828 | 0.71 | BLM (0.43) | ALDH1A1CES2CES1TSHRDAO | |
| SCHEMBL19562856 | 0.71 | ALDH1A1 (0.41) | ALDH1A1CES2CES1TSHRDAO | |
| SCHEMBL16089348 | 0.71 | BLM (0.43) | ALDH1A1CES2CES1TSHRDAO | |
| SCHEMBL862271 | 0.71 | ALDH1A1 (0.45) | ALDH1A1CES2CES1TSHRDAO | |
| Water SCHEMBL9518556 | 0.71 | HPGD (0.61) | ALDH1A1CES2CES1TSHRDAO | |
| SCHEMBL6101452 | 0.71 | F2 (0.43) | ALDH1A1CES2CES1TSHRDAO | |
| SCHEMBL18138454 | 0.71 | CES1 (0.48) | ALDH1A1CES2CES1TSHRDAO |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1639053-B1 | CMP OF NOBLE METALS | CABOT MICROELECTRONICS CORP (US) | 2017-01-04 | — | — | EP | claimed |
| US-7160807-B2 | CMP of noble metals | CABOT MICROELECTRONICS CORPORATION (US) | 2007-01-09 | — | — | US | claimed |
| EP-1639053-A1 | CMP OF NOBLE METALS | Cabot Microelectronics Corporation (US) | 2006-03-29 | — | — | EP | claimed |
| WO-2005005561-A1 | CMP OF NOBLE METALS | CABOT MICROELECTRONICS CORPORATION (US) | 2005-01-20 | — | — | WO | claimed |
| US-20040266196-A1 | CMP of noble metals | CABOT MICROELECTRONICS CORPORATION | 2004-12-30 | — | — | US | claimed |
| CN-110143882-B | Method for producing 1, 5-pentanediamine by chemical decarboxylation of L-lysine and separation and extraction method | 郑州中科新兴产业技术研究院 | 2022-02-22 | — | — | CN | disclosed |
| EP-1639053-B1 | CMP OF NOBLE METALS | CABOT MICROELECTRONICS CORP (US) | 2017-01-04 | — | — | EP | disclosed |
| EP-1797152-B1 | POLISHING COMPOSITION FOR NOBLE METALS | CABOT MICROELECTRONICS CORP (US) | 2015-09-16 | — | — | EP | disclosed |
| EP-2431434-A1 | Polishing Composition for Noble Metals | Cabot Microelectronics Corporation (US) | 2012-03-21 | — | — | EP | disclosed |
| US-7563383-B2 | CMP composition with a polymer additive for polishing noble metals | Cabot Mircroelectronics Corporation (US) | 2009-07-21 | — | — | US | disclosed |
| EP-1799785-A2 | CMP COMPOSITION WITH A POLYMER ADDITIVE FOR POLISHING NOBLE METALS | CABOT MICROELECTRONICS CORPORATION (US) | 2007-06-27 | — | — | EP | disclosed |
| EP-1797152-A1 | POLISHING COMPOSITION FOR NOBLE METALS | Cabot Microelectronics Corporation (US) | 2007-06-20 | — | — | EP | disclosed |
| US-7160807-B2 | CMP of noble metals | CABOT MICROELECTRONICS CORPORATION (US) | 2007-01-09 | — | — | US | disclosed |
| WO-2006044417-A2 | CMP COMPOSITION WITH A POLYMER ADDITIVE FOR POLISHING NOBLE METALS | CABOT MICROELECTRONICS CORPORATION (US) | 2006-04-27 | — | — | WO | disclosed |
| US-20060076317-A1 | CMP composition with a polymer additive for polishing noble metals | CABOT MICROELECTRONICS CORPORATION (US) | 2006-04-13 | — | — | US | disclosed |
| EP-1639053-A1 | CMP OF NOBLE METALS | Cabot Microelectronics Corporation (US) | 2006-03-29 | — | — | EP | disclosed |
| WO-2006023105-A1 | POLISHING COMPOSITION FOR NOBLE METALS | CABOT MICROELECTRONICS CORPORATION (US) | 2006-03-02 | — | — | WO | disclosed |
| US-20060024967-A1 | Polishing composition for noble metals | CABOT MICROELECTRONICS CORPORATION (US) | 2006-02-02 | — | — | US | disclosed |
| WO-2005005561-A1 | CMP OF NOBLE METALS | CABOT MICROELECTRONICS CORPORATION (US) | 2005-01-20 | — | — | WO | disclosed |
| US-20040266196-A1 | CMP of noble metals | CABOT MICROELECTRONICS CORPORATION | 2004-12-30 | — | — | US | disclosed |