Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | CES2 | O00748 | 2/20 | 0.38 |
| ▸ | HPGDS | O60760 | 2/20 | 0.32 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL456619 | 1.00 | — | — | |
| SCHEMBL16216047 | 0.90 | EPHX1 (0.40) | LMNACES2EPHX1 | |
| SCHEMBL15472997 | 0.90 | EPHX1 (0.40) | LMNACES2EPHX1 | |
| SCHEMBL12303578 | 0.87 | LMNA (0.37) | LMNACES2 | |
| SCHEMBL13616892 | 0.87 | LMNA (0.37) | LMNACES2 | |
| SCHEMBL13559139 | 0.87 | LMNA (0.37) | LMNACES2 | |
| SCHEMBL13360079 | 0.87 | LMNA (0.37) | LMNACES2 | |
| SCHEMBL807045 | 0.87 | LMNA (0.37) | LMNACES2 | |
| SCHEMBL14639246 | 0.87 | LMNA (0.37) | LMNACES2 | |
| SCHEMBL3145985 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20140205947-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2014-07-24 | — | — | US | disclosed |
| US-20140205947-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2014-07-24 | — | — | US | disclosed |
| US-8722319-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-05-13 | — | — | US | disclosed |
| US-8722319-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-05-13 | — | — | US | disclosed |
| US-20120077122-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120077122-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20020146515-A1 | Aqueous compositions for coating metal components | BASF AKTIENGESELLSCHAFT (DE) | 2002-10-10 | — | — | US | disclosed |
| EP-1229086-A1 | Utilisation of aqueous polymer dispersion compositions for the coating of metal objects | BASF AKTIENGESELLSCHAFT (DE) | 2002-08-07 | — | — | EP | disclosed |
| US-5448000-A | Making sulfonic acid-terminated polyisobutylene by polymerizing isobutylene in presence of initiator, electron donor, solvent and Lewis acid, then end-quenching | NEW MEXICO TECH RESEARCH FOUNDATION (US) | 1995-09-05 | — | — | US | disclosed |