SCHEMBL7530877

SCHEMBL7530877

O=C(O)C(=CC=Cc1ccccc1[N+](=O)[O-])C(=O)O

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.62
MAOB P27338 1/20 0.57
SOS1 Q07889 1/20 0.55
MEN1 O00255 4/20 0.55
KMT2A Q03164 4/20 0.55
NPSR1 Q6W5P4 2/20 0.54
RAB9A P51151 5/20 0.54
NPC1 O15118 4/20 0.54
SMN1; SMN2 Q16637 3/20 0.54
KDM4E B2RXH2 1/20 0.54
NFKB1 P19838 1/20 0.54
NFKB2 Q00653 1/20 0.54
RELA Q04206 1/20 0.54
MITF O75030 2/20 0.53
ALDH1A1 P00352 7/20 0.51
LMNA P02545 4/20 0.51
GAA P10253 2/20 0.51
HTT P42858 1/20 0.51
ATM Q13315 2/20 0.49
HSP90AA1 P07900 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7530881 1.00 MAPT (0.62) MAPTMAOBSOS1MEN1KMT2A
SCHEMBL11594911 0.89 MAPT (0.51) MAPTMAOBSOS1MEN1KMT2A
SCHEMBL8922355 0.81 MAPT (0.58) MAPTMAOBSOS1MEN1KMT2A
SCHEMBL8922348 0.81 MAPT (0.58) MAPTMAOBSOS1MEN1KMT2A
SCHEMBL8922338 0.81 MAPT (0.58) MAPTMAOBSOS1MEN1KMT2A
SCHEMBL5440784 0.81 SOS1 (0.71) MAPTMAOBSOS1MEN1KMT2A
SCHEMBL5440780 0.81 SOS1 (0.71) MAPTMAOBSOS1MEN1KMT2A
SCHEMBL7829312 0.80 MAPT (0.69) MAPTMAOBMEN1KMT2ANPSR1
SCHEMBL7829304 0.80 MAPT (0.69) MAPTMAOBMEN1KMT2ANPSR1
SCHEMBL1232666 0.79 MAPT (0.79) MAPTMAOBSOS1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4101326-A Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters EASTMAN KODAK COMPANY (US) 1978-07-18 US claimed
EP-0849636-B1 Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element KODAK POLYCHROME GRAPHICS CO (US) 2002-04-10 EP disclosed
US-6270945-B1 BLEND OF PHOTOPOLYMERIZABLE POLYMER AND DYE KODAK POLYCHROME GRAPHICS, LLC 2001-08-07 US disclosed
US-5962189-A Photosensitive composition containing photosensitive polyamide and thiazoline photoinitiator and negative working photosensitive element KODAK POLYCHROME GRAPHICS LLC (US) 1999-10-05 US disclosed
US-5925498-A Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates KODAK POLYCHROME GRAPHICS LLC (US) 1999-07-20 US disclosed
US-5879858-A COMPOSITION COMPRISING RESIN CONTAINING UNSATURATED PHOTOCROSSLINKABLE GROUPS, PHOTOPOLYMERIZABLE MONOMER, PHOTOCROSSLINKABLE POLYESTER RESIN, PHOTOINITIATOR KODAK POLYCHROME GRAPHICS, LLC (US) 1999-03-09 US disclosed
WO-1998058296-A1 PHOTOSENSITIVE POLYMER COMPOSITION AND ELEMENT CONTAINING PHOTOSENSITIVE POLYAMIDE AND MIXTURE OF ACRYLATES KODAK POLYCHROME GRAPHICS, L.L.C. (US) 1998-12-23 WO disclosed
US-5821032-A A PHOTOCURABLE FORMULATION CONTAINS ETHYLENICALLY UNSATURATED PHOTOCROSSLINKABLE GROUPS, AN ETHYLENICALLY UNSATURATED PHOTOPOLYMERIZABLE MONOMER, A CROSSLINKABLE POLYESTER, CROSSLINKABLE STYRENE-MALEIC ANHYDRIDE AND PHOTOINITIATOR KODAK POLYCHROME GRAPHICS, LLC (US) 1998-10-13 US disclosed
EP-0849636-A1 Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element EASTMAN KODAK COMPANY (US) 1998-06-24 EP disclosed
EP-0576622-B1 LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK CO (US) 1997-11-05 EP disclosed
EP-0218159-A1 Anodized aluminum support, method for the preparation thereof and lithographic printing plate containing same EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-04-15 EP disclosed
US-4647346-A IMPROVED ABRASION RESISTANCE EASTMAN KODAK COMPANY (US) 1987-03-03 US disclosed
US-4640886-A ANODIZED, SILICATED ALUMINUM SUPPORT, RADIATION SENSITIVE POLYESTER, BENZOIC ACID LAYERS TO IMPROVE INCUBATION STABILITY EASTMAN KODAK COMPANY (US) 1987-02-03 US disclosed
US-4609606-A LITHOGRAPHIC PRINTING PLATES EASTMAN KODAK COMPANY (US) 1986-09-02 US disclosed
EP-0070898-B1 IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1985-10-16 EP disclosed
US-4419437-A SULFONIMIDE-CONTAINING AROMATIC DICARBOXYLIC ACID EASTMAN KODAK COMPANY (US) 1983-12-06 US disclosed
EP-0070898-A4 IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS. EASTMAN KODAK CO (US) 1983-07-04 EP disclosed
EP-0070898-A1 IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS. EASTMAN KODAK CO (US) 1983-02-09 EP disclosed
WO-1982002780-A1 IMAGE-FORMING COMPOSITIONS CONTAINING PIGMENTS AND IONIC POLYESTER DISPERSING AGENTS EASTMAN KODAK CO (US) 1982-08-19 WO disclosed
US-4263394-A Aqueous alkaline soluble photopolymerizable material VICKERS LIMITED (GB) 1981-04-21 US disclosed