SCHEMBL7539461

SCHEMBL7539461

CCC(OC(C)=O)C(C)O

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.46
TDP1 Q9NUW8 1/20 0.42
TRPV1 Q8NER1 1/20 0.41
CHRM2 P08172 1/20 0.40
CHRM4 P08173 1/20 0.40
CHRM1 P11229 1/20 0.40
TBXA2R P21731 1/20 0.40
GALR3 O60755 1/20 0.39
MAPT P10636 1/20 0.39
BLM P54132 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
ALDH1A1 P00352 2/20 0.35
LMNA P02545 1/20 0.35
HSD17B10 Q99714 1/20 0.35
PGD P52209 1/20 0.33
ALOX15 P16050 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7875149 0.85 TDP1 (0.48) TSHRTDP1TRPV1CHRM2CHRM4
SCHEMBL17353405 0.83 TSHR (0.36) TSHRTRPV1ALDH1A1LMNA
SCHEMBL1698005 0.83 TSHR (0.48) TSHRTDP1TRPV1CHRM2CHRM4
SCHEMBL1232896 0.83 TSHR (0.48) TSHRTDP1TRPV1CHRM2CHRM4
SCHEMBL15261665 0.81 TSHR (0.46) TSHRTDP1TRPV1CHRM2CHRM4
SCHEMBL28528169 0.81 TSHR (0.46) TSHRTDP1TRPV1CHRM2CHRM4
SCHEMBL28491605 0.81 TSHR (0.46) TSHRTDP1TRPV1CHRM2CHRM4
SCHEMBL12175911 0.81 TDP1 (0.42) TSHRTDP1TRPV1CHRM2CHRM4
SCHEMBL544721 0.81 TSHR (0.35) TSHRMAPTALDH1A1
SCHEMBL362428 0.81 TSHR (0.46) TSHRTDP1TRPV1CHRM2CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111139134-A Refining method of idesia polycarpa oil with high acid value 中粮工科(西安)国际工程有限公司 2020-05-12 CN disclosed
US-20020064731-A1 Radiation-sensitive mixture and production of relief structures KIM SON NGUYEN (DE) 2002-05-30 US disclosed
US-5914219-A Radiation-sensitive mixture and the production of relief structures having improved contrast BASF AKTIENGESELLSCHAFT (DE) 1999-06-22 US disclosed
US-5759750-A Radiation-sensitive mixture BASF AKTIENGESELLSCHAFT (DE) 1998-06-02 US disclosed
US-5563022-A MIXTURE OF WATER INSOLUBLE ORGANIC BINDER HAVING ACID-LABILE ETHER, ESTER OR CARBONATE GROUPS OR BEING SOLUBLE IN ALKALINE SOLUTIONS, ORGANIC COMPOUND WHOSE SOLUBILITY IS INCREASED BY ACID, ARYLSULFONIC ESTER BASF AKTIENGESELLSCHAFT (DE) 1996-10-08 US disclosed
US-5167863-A Ferroelectricity; electrooptic switches HITACHI, LTD. (JP) 1992-12-01 US disclosed
US-5035979-A Radiation-sensitive mixture BASF AKTIENGESELLSCHAFT (DE) 1991-07-30 US disclosed
US-5034305-A Mixtures for photoresists of water insolublr binders soluble in alkaline mixtures, compound forming a strong acid and solubility inhibitors BASF AKTIENGESELLSCHAFT (DE) 1991-07-23 US disclosed
EP-0322862-A2 Optically active compounds, their preparation and their use in liquid crystal compositions and liquid crystal optical modulators HITACHI, LTD. (JP) 1989-07-05 EP disclosed