Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TLR4 | O00206 | 1/20 | 0.61 |
| ▸ | TLR2 | O60603 | 1/20 | 0.61 |
| ▸ | LTA4H | P09960 | 2/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | LCK | P06239 | 1/20 | 0.55 |
| ▸ | AHR | P35869 | 1/20 | 0.53 |
| ▸ | CHRNA7 | P36544 | 3/20 | 0.51 |
| ▸ | CHRNA10 | Q9GZZ6 | 3/20 | 0.51 |
| ▸ | CHRNA9 | Q9UGM1 | 3/20 | 0.51 |
| ▸ | CYSLTR2 | Q9NS75 | 1/20 | 0.51 |
| ▸ | SMPD1 | P17405 | 3/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7539459 | 0.98 | TLR4 (0.59) | TLR4TLR2LTA4HTSHRLCK | |
| SCHEMBL7541623 | 0.90 | LCK (0.58) | TLR4TLR2LCKCHRNA7CHRNA10 | |
| SCHEMBL7541618 | 0.90 | LCK (0.58) | TLR4TLR2LCKCHRNA7CHRNA10 | |
| SCHEMBL17864841 | 0.84 | TLR4 (0.65) | TLR4TLR2LTA4HTSHRLCK | |
| SCHEMBL677283 | 0.83 | TSHR (0.58) | TLR4TLR2LTA4HTSHRCYSLTR2 | |
| SCHEMBL5740101 | 0.83 | CHRNA7 (0.68) | LTA4HAHRCHRNA7CHRNA10CHRNA9 | |
| SCHEMBL7538209 | 0.83 | CHRNA7 (0.68) | LTA4HAHRCHRNA7CHRNA10CHRNA9 | |
| SCHEMBL5739190 | 0.83 | CHRNA7 (0.68) | LTA4HAHRCHRNA7CHRNA10CHRNA9 | |
| SCHEMBL5740096 | 0.83 | CHRNA7 (0.68) | LTA4HAHRCHRNA7CHRNA10CHRNA9 | |
| SCHEMBL5739187 | 0.83 | CHRNA7 (0.68) | LTA4HAHRCHRNA7CHRNA10CHRNA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20020015906-A1 | Polymer for photoresist, method of production thereof and photoresist composition containing polymer | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-02-07 | — | — | US | disclosed |