SCHEMBL7539459

SCHEMBL7539459

CCCCCCCOc1cccc(C=Cc2ccccc2)c1

nearest known ligand 0.59

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TLR4 O00206 1/20 0.59
TLR2 O60603 1/20 0.59
TSHR P16473 1/20 0.58
LTA4H P09960 1/20 0.54
LCK P06239 1/20 0.54
CYSLTR2 Q9NS75 1/20 0.53
SMPD1 P17405 3/20 0.52
CHRNA7 P36544 3/20 0.52
CHRNA10 Q9GZZ6 3/20 0.52
CHRNA9 Q9UGM1 3/20 0.52
AHR P35869 1/20 0.51
PLA2G4B P0C869 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7541558 0.98 TLR4 (0.61) TLR4TLR2TSHRLTA4HLCK
SCHEMBL7541623 0.89 LCK (0.58) TLR4TLR2LCKCHRNA7CHRNA10
SCHEMBL7541618 0.89 LCK (0.58) TLR4TLR2LCKCHRNA7CHRNA10
SCHEMBL5740101 0.85 CHRNA7 (0.68) LTA4HCHRNA7CHRNA10CHRNA9AHR
SCHEMBL7538209 0.85 CHRNA7 (0.68) LTA4HCHRNA7CHRNA10CHRNA9AHR
SCHEMBL5739190 0.85 CHRNA7 (0.68) LTA4HCHRNA7CHRNA10CHRNA9AHR
SCHEMBL5740096 0.85 CHRNA7 (0.68) LTA4HCHRNA7CHRNA10CHRNA9AHR
SCHEMBL5739187 0.85 CHRNA7 (0.68) LTA4HCHRNA7CHRNA10CHRNA9AHR
SCHEMBL9717028 0.84 KDM4E (0.72) TLR4TLR2TSHRCYSLTR2SMPD1
SCHEMBL7970157 0.84 KDM4E (0.72) TLR4TLR2TSHRCYSLTR2SMPD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020015906-A1 Polymer for photoresist, method of production thereof and photoresist composition containing polymer SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-02-07 US disclosed