⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27368627 | 0.81 | CA12 (0.31) | — | |
| SCHEMBL17624746 | 0.79 | TP53 (0.32) | — | |
| SCHEMBL5392636 | 0.75 | ALDH1A1 (0.35) | — | |
| SCHEMBL10645336 | 0.73 | — | — | |
| SCHEMBL28514098 | 0.73 | MME (0.38) | — | |
| SCHEMBL11679768 | 0.73 | MEN1 (0.32) | — | |
| SCHEMBL10375569 | 0.71 | TSHR (0.33) | — | |
| SCHEMBL7777535 | 0.71 | ALDH1A1 (0.32) | — | |
| SCHEMBL18638143 | 0.71 | — | — | |
| SCHEMBL27881824 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0668269-B1 | Process for the sulfinylation of heterocyclic compounds | AVENTIS CROPSCIENCE SA (FR) | 2002-05-29 | — | — | EP | claimed |
| CN-105439171-B | Method for preparing SAPO-34 molecular sieve by using carbonate as synthesis accelerator and application thereof | 天津众智科技有限公司 | 2021-05-11 | — | — | CN | disclosed |
| CN-108642542-A | A kind of method of metal processing and metal plastic composite material | 龙舜化工（南通）有限公司 | 2018-10-12 | — | — | CN | disclosed |
| CN-105331979-B | A kind of aluminium chemical polishing liquid and the polishing method using the polishing fluid | 上海瑞特良化工有限公司 | 2017-12-26 | — | — | CN | disclosed |
| CN-105439171-A | Method for preparing SAPO-34 molecular sieve by using carbonate as synthesis prompting agent, and applications thereof | TIANJIN SIGMA INNOVA TECH CO LTD | 2016-03-30 | — | — | CN | disclosed |
| WO-2013147286-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-10-03 | — | — | WO | disclosed |
| CN-102292365-A | Dispersed two-component polyurethane foams | — | 2011-12-21 | — | — | CN | disclosed |
| CN-1130345-C | Amino quinoline derivatives | HOFFMANN LA ROCHE (CH) | 2003-12-10 | — | — | CN | disclosed |
| CN-1054124-C | Aminoquinoline derivatives and their salts | HOFFMANN LA ROCHE (CH) | 2000-07-05 | — | — | CN | disclosed |
| CN-1245168-A | Amino quinoline derivatives | HOFFMANN LA ROCHE (CH) | 2000-02-23 | — | — | CN | disclosed |
| CN-1106389-A | Aminoquinoline derivatives | HOFFMANN LA ROCHE (CH) | 1995-08-09 | — | — | CN | disclosed |