SCHEMBL7543729

SCHEMBL7543729

O=C(O)C=CC(=O)OC1(C2CCCC2)CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
NPC1 O15118 1/20 0.39
GAA P10253 1/20 0.39
HCAR2 Q8TDS4 4/20 0.34
ATM Q13315 1/20 0.34
LMNA P02545 3/20 0.32
TP53 P04637 2/20 0.32
CYP3A4 P08684 2/20 0.32
MEN1 O00255 1/20 0.32
MITF O75030 1/20 0.32
MAPT P10636 1/20 0.32
ALOX15 P16050 1/20 0.32
KMT2A Q03164 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
NLRP1 Q9C000 1/20 0.32
GPR55 Q9Y2T6 1/20 0.32
POLB P06746 1/20 0.31
TSHR P16473 4/20 0.30
CYP2C9 P11712 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7543722 1.00 HTT (0.39) HTTSMN1; SMN2NPC1GAAHCAR2
SCHEMBL31190321 1.00 HTT (0.39) HTTSMN1; SMN2NPC1GAAHCAR2
SCHEMBL780365 1.00 HTT (0.39) HTTSMN1; SMN2NPC1GAAHCAR2
SCHEMBL7543720 0.93 CYP3A4 (0.33) LMNACYP3A4MEN1KMT2ANPSR1
SCHEMBL31190331 0.88 HCAR2 (0.34) HTTSMN1; SMN2NPC1GAAHCAR2
SCHEMBL31190302 0.86 HCAR2 (0.35) HCAR2ATM
SCHEMBL31190309 0.84 HCAR2 (0.36) HCAR2
SCHEMBL31190395 0.84 EPHX1 (0.34) HTTSMN1; SMN2HCAR2
SCHEMBL31190304 0.84 HCAR2 (0.39) HTTSMN1; SMN2HCAR2LMNATP53
SCHEMBL930662 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020190818-A1 High frequency band pass filter TDK CORPORATION (JP) 2002-12-19 US disclosed
EP-0788118-B1 Low dielectric polymer and film, substrate and electronic part using the same TDK CORP (JP) 2002-11-20 EP disclosed
EP-1006130-A1 Fumaric acid diester resin composition, cross-linked fumaric acid diester resin and process NOF CORPORATION (JP) 2000-06-07 EP disclosed
US-5914283-A FUMARIC ACID DIESTER MONOMER-CONTAINING POLYMER FILM; HEAT RESISTANCE, WEATHER RESISTANCE TDK CORPORATION (JP) 1999-06-22 US disclosed
EP-0788118-A1 Low dielectric polymer and film, substrate and electronic part using the same TDK Corporation (JP) 1997-08-06 EP disclosed