Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 4/20 | 0.61 |
| ▸ | CA1 | P00915 | 4/20 | 0.61 |
| ▸ | CA2 | P00918 | 4/20 | 0.61 |
| ▸ | CA7 | P43166 | 4/20 | 0.61 |
| ▸ | CA9 | Q16790 | 4/20 | 0.61 |
| ▸ | CA14 | Q9ULX7 | 4/20 | 0.61 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.61 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.61 |
| ▸ | LIG1 | P18858 | 1/20 | 0.61 |
| ▸ | MEN1 | O00255 | 2/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.57 |
| ▸ | USP2 | O75604 | 1/20 | 0.57 |
| ▸ | GAA | P10253 | 1/20 | 0.57 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.57 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.57 |
| ▸ | HPGD | P15428 | 3/20 | 0.54 |
| ▸ | MAPT | P10636 | 2/20 | 0.54 |
| ▸ | ESR1 | P03372 | 1/20 | 0.54 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.54 |
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30063097 | 0.98 | LIG1 (0.64) | CA12CA1CA2CA7CA9 | |
| SCHEMBL6374935 | 0.98 | LIG1 (0.64) | CA12CA1CA2CA7CA9 | |
| SCHEMBL7716523 | 0.91 | CA12 (0.61) | CA12CA1CA2CA7CA9 | |
| SCHEMBL30669850 | 0.91 | CA12 (0.61) | CA12CA1CA2CA7CA9 | |
| SCHEMBL29457566 | 0.90 | MEN1 (0.72) | CA12CA1CA2CA7CA9 | |
| SCHEMBL2868140 | 0.90 | MEN1 (0.72) | CA12CA1CA2CA7CA9 | |
| SCHEMBL7717195 | 0.90 | CA12 (0.55) | CA12CA1CA2CA7CA9 | |
| SCHEMBL3905124 | 0.88 | CA12 (0.70) | CA12CA1CA2CA7CA9 | |
| SCHEMBL7718579 | 0.87 | CA12 (0.57) | CA12CA1CA2CA7CA9 | |
| SCHEMBL7713698 | 0.84 | FASN (0.59) | CA12CA1CA2CA7CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0742490-B1 | Positive acid catalized resists | SHIPLEY CO LLC (US) | 2002-06-12 | — | — | EP | disclosed |
| EP-0496640-B2 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-09-19 | — | — | EP | disclosed |
| US-5917024-A | Acid labile photoactive composition | SHIPLEY COMPANY, L.L.C. (US) | 1999-06-29 | — | — | US | disclosed |
| US-5858605-A | PHOTORESIST COATING COMPRISING ALKALI SOLUBLE RESIN AND PHOTOACTIVE COMPOUND, REACTION PRODUCT OF VINYL ETHER AND ORTHO-NAPHTHOQUINONEDIAZIDE SULFONYL COMPOUND, DISSOLVED IN SOLVENT | SHIPLEY COMPANY, L.L.C. (US) | 1999-01-12 | — | — | US | disclosed |
| US-5827634-A | FOR DEEP ULTRAVIOLET EXPOSURE; RESOLUTION | SHIPLEY COMPANY, L.L.C. (US) | 1998-10-27 | — | — | US | disclosed |
| EP-0443820-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1998-09-09 | — | — | EP | disclosed |
| US-5763536-A | PHOTORESIST BINDER CONSISTING OF NOVOLAK RESIN OR POLYVINYLPHENOL RESIN | SHIPLEY COMPANY, L.L.C. (US) | 1998-06-09 | — | — | US | disclosed |
| US-5753406-A | ALKALI-SOLUBLE NOVOLAK RESIN, 1,2-QUINONEDIAZIDE COMPOUND, AND SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-19 | — | — | US | disclosed |
| US-5731386-A | Polymer for positive acid catalyzed resists | SHIPLEY COMPANY, L.L.C. (US) | 1998-03-24 | — | — | US | disclosed |
| US-5719003-A | Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers | SHIPLEY COMPANY, L.L.C. (US) | 1998-02-17 | — | — | US | disclosed |
| EP-0742490-A1 | Positive acid catalized resists | Shipley Company LLC (US) | 1996-11-13 | — | — | EP | disclosed |
| EP-0428398-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| US-5478691-A | Blend of alkali-soluble novolak resin and 1,2-quinonediazidecompound | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
| US-5413896-A | Light sensitive element with novolak resin and quinonediazide compounds | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-05-09 | — | — | US | disclosed |
| EP-0365318-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1994-03-16 | — | — | EP | disclosed |
| US-5238775-A | Alkali-soluble resin and photoinitiator comprising a 1,2-quinone diazide sulfonate derivative of 1,1-bis (hydroxyphenyl)-1-(4-(4-hydroxybenzyl)ethanes; positive photoresists; heat resistance; inhibits scum | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-08-24 | — | — | US | disclosed |
| EP-0496640-A1 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-29 | — | — | EP | disclosed |
| US-5110706-A | Photoresists for highly reflective substrates | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-05-05 | — | — | US | disclosed |
| EP-0443820-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-08-28 | — | — | EP | disclosed |
| EP-0428398-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-22 | — | — | EP | disclosed |