Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 4/20 | 0.55 |
| ▸ | CA1 | P00915 | 4/20 | 0.55 |
| ▸ | CA2 | P00918 | 4/20 | 0.55 |
| ▸ | CA7 | P43166 | 4/20 | 0.55 |
| ▸ | CA9 | Q16790 | 4/20 | 0.55 |
| ▸ | CA14 | Q9ULX7 | 4/20 | 0.55 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.55 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.55 |
| ▸ | GAA | P10253 | 3/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.52 |
| ▸ | MAPT | P10636 | 2/20 | 0.52 |
| ▸ | POLB | P06746 | 1/20 | 0.52 |
| ▸ | CA4 | P22748 | 1/20 | 0.52 |
| ▸ | CA6 | P23280 | 1/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.52 |
| ▸ | LIG1 | P18858 | 1/20 | 0.50 |
| ▸ | SIRT1 | Q96EB6 | 2/20 | 0.49 |
| ▸ | SYNJ2 | O15056 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7551892 | 0.90 | CA12 (0.61) | CA12CA1CA2CA7CA9 | |
| SCHEMBL6374935 | 0.88 | LIG1 (0.64) | CA12CA1CA2CA7CA9 | |
| SCHEMBL30063097 | 0.88 | LIG1 (0.64) | CA12CA1CA2CA7CA9 | |
| SCHEMBL29450505 | 0.86 | MEN1 (0.65) | CA12CA1CA2CA7CA9 | |
| SCHEMBL125785 | 0.86 | MEN1 (0.65) | CA12CA1CA2CA7CA9 | |
| SCHEMBL7716523 | 0.85 | CA12 (0.61) | CA12CA1CA2CA7CA9 | |
| SCHEMBL30669850 | 0.85 | CA12 (0.61) | CA12CA1CA2CA7CA9 | |
| SCHEMBL19003399 | 0.83 | CA12 (0.56) | CA12CA1CA2CA7CA9 | |
| SCHEMBL3905124 | 0.83 | CA12 (0.70) | CA12CA1CA2CA7CA9 | |
| SCHEMBL7713698 | 0.82 | FASN (0.59) | CA12CA1CA2CA7CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5283324-A | Reacting phenol compound and quinone diazide sulfonyl halide in solvent mixtures of different dielectric constants | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-02-01 | — | — | US | claimed |
| US-6383708-B1 | ALKALI SOLUBLE NOVOLAK RESIN AN ESTER OF HYDROXYL GROUPS CONTAINING QUINONE DIAZIDE SULFONIC ACID AND SOLVENTS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-07 | — | — | US | disclosed |
| US-6296992-B1 | CONTACT APERTURES BY PHASE SHIFT METHOD WITH PHOTORESIST FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-10-02 | — | — | US | disclosed |
| US-6245478-B1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-06-12 | — | — | US | disclosed |
| US-6207340-B1 | POSITIVE PHOTORESISTS ALKALI-SOLUBLE RESIN; (B) A NAPHTHOQUINONEDIAZIDE GROUP-CONTAINING COMPOUND; AND (C) A SOLVENT FOR PATTERN IMAGES | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-03-27 | — | — | US | disclosed |
| US-6177226-B1 | PROVIDES A CONTACT HOLE PATTERN IMAGE HAVING LESS DIMPLES AND BEING IN EXACT ACCORDANCE WITH A MASK PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-01-23 | — | — | US | disclosed |
| EP-0557991-B1 | Positive type resist composition | SUMITOMO CHEMICAL CO (JP) | 2000-01-26 | — | — | EP | disclosed |
| EP-0550009-B1 | Positive resist composition | SUMITOMO CHEMICAL CO (JP) | 1999-06-02 | — | — | EP | disclosed |
| US-5849457-A | Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and γ- | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-12-15 | — | — | US | disclosed |
| EP-0559204-B1 | Positive type resist composition | SUMITOMO CHEMICAL CO (JP) | 1998-09-30 | — | — | EP | disclosed |
| EP-0528401-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-02-24 | — | — | EP | disclosed |
| US-5188920-A | Photosensitivity, resolution, heat resistance, adhesiveness | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-02-23 | — | — | US | disclosed |
| EP-0525185-A1 | POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1993-02-03 | — | — | EP | disclosed |
| EP-0510670-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-28 | — | — | EP | disclosed |
| EP-0510671-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-28 | — | — | EP | disclosed |
| EP-0509431-A1 | Process for preparing radiation sensitive compound and positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-21 | — | — | EP | disclosed |
| US-5130225-A | And alkali soluble resin, a quinone oxazide compound and a hydroxyl containing compound, film thickness retention | SUMITOMO CHEMICAL CO. LTD. (JP) | 1992-07-14 | — | — | US | disclosed |
| EP-0461388-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0461654-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0460416-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-11 | — | — | EP | disclosed |