SCHEMBL7553181

SCHEMBL7553181

C/C=C\C(C)COC(C)=O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.39
SMN1; SMN2 Q16637 3/20 0.38
USP2 O75604 3/20 0.38
CYP3A4 P08684 3/20 0.38
MAPT P10636 3/20 0.38
LMNA P02545 2/20 0.38
RECQL P46063 1/20 0.38
ALDH1A1 P00352 5/20 0.37
HSD17B10 Q99714 1/20 0.37
ALOX15 P16050 1/20 0.35
TSHR P16473 4/20 0.33
HPGD P15428 1/20 0.33
CHRM5 P08912 2/20 0.31
CHRM1 P11229 2/20 0.31
CHRM3 P20309 2/20 0.31
PGR P06401 1/20 0.31
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
HTR1A P08908 1/20 0.31
CHRNB2 P17787 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7553185 1.00 TDP1 (0.39) TDP1SMN1; SMN2USP2CYP3A4MAPT
SCHEMBL14456673 0.86 TDP1 (0.36) TDP1SMN1; SMN2USP2CYP3A4MAPT
SCHEMBL9540449 0.83 TSHR (0.33) TSHR
SCHEMBL9540448 0.83 TSHR (0.33) TSHR
SCHEMBL9540454 0.83 TSHR (0.33) TSHR
SCHEMBL28922701 0.80 TSHR (0.60) ALDH1A1TSHR
SCHEMBL27799241 0.79 TDP1 (0.37) TDP1SMN1; SMN2USP2CYP3A4MAPT
SCHEMBL7559315 0.79 ALOX15 (0.49) SMN1; SMN2LMNAALDH1A1HSD17B10ALOX15
SCHEMBL7559306 0.79 ALOX15 (0.49) SMN1; SMN2LMNAALDH1A1HSD17B10ALOX15
SCHEMBL709217 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170075222-A1 PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-03-16 US disclosed
EP-0950652-B1 Cis-configurational unsaturated ester, process for producing the same, and fragrance composition containing the same KURARAY CO (JP) 2002-07-03 EP disclosed
US-6159928-A Cis-configurational unsaturated ester, process for producing the same, and fragrance composition containing the same KURARAY CO., LTD. (JP) 2000-12-12 US disclosed
EP-0950652-A1 Cis-configurational unsaturated ester, process for producing the same, and fragrance composition containing the same KURARAY CO., LTD. (JP) 1999-10-20 EP disclosed