Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.36 |
| ▸ | NPC1 | O15118 | 3/20 | 0.36 |
| ▸ | RAB9A | P51151 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.36 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.36 |
| ▸ | RELA | Q04206 | 1/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.34 |
| ▸ | CYP2E1 | P05181 | 1/20 | 0.34 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.34 |
| ▸ | CYP2B6 | P20813 | 1/20 | 0.34 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.34 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL4678013 | 0.98 | HDAC6 (0.38) | HDAC6ALDH1A1NPC1RAB9AMEN1 | |
| Hydrochloric Acid SCHEMBL7612117 | 0.98 | HDAC6 (0.38) | HDAC6ALDH1A1NPC1RAB9AMEN1 | |
| Iodide SCHEMBL7997291 | 0.98 | HDAC6 (0.38) | HDAC6ALDH1A1NPC1RAB9AMEN1 | |
| Fluoride SCHEMBL124319 | 0.96 | HDAC6 (0.37) | HDAC6ALDH1A1NPC1RAB9AMEN1 | |
| SCHEMBL1002067 | 0.94 | HDAC6 (0.39) | HDAC6ALDH1A1NPC1RAB9AMEN1 | |
| SCHEMBL31303612 | 0.93 | HDAC6 (0.38) | HDAC6ALDH1A1NPC1RAB9AMEN1 | |
| SCHEMBL31314895 | 0.93 | HDAC6 (0.38) | HDAC6ALDH1A1NPC1RAB9AMEN1 | |
| SCHEMBL31314886 | 0.93 | HDAC6 (0.38) | HDAC6ALDH1A1NPC1RAB9AMEN1 | |
| SCHEMBL3500721 | 0.87 | HDAC6 (0.38) | HDAC6NPC1RAB9ASMN1; SMN2CNR1 | |
| SCHEMBL4379434 | 0.87 | HDAC6 (0.38) | HDAC6NPC1RAB9ASMN1; SMN2CNR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12287574-B2 | Resin composition and flow cells incorporating the same | ILLUMINA, INC. (US) | 2025-04-29 | — | — | US | claimed |
| CN-119200070-A | Polarizing plate, method of manufacturing the same, and optical display device including the same | 三星SDI株式会社 | 2024-12-27 | — | — | CN | claimed |
| EP-3613070-B1 | PHOTOPATTERNABLE FILM | UNIV CHICAGO (US) | 2023-10-18 | — | — | EP | claimed |
| US-20220404699-A1 | RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME | ILLUMINA, INC. | 2022-12-22 | — | — | US | claimed |
| EP-4081862-A1 | RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME | Illumina, Inc. (US) | 2022-11-02 | — | — | EP | claimed |
| US-11187830-B2 | Polarizing plate, method for manufacturing polarizing plate, and optical display device comprising same | SAMSUNG SDI CO., LTD. (KR) | 2021-11-30 | — | — | US | claimed |
| EP-3883745-A1 | PRECISION SYSTEM FOR ADDITIVE FABRICATION | Inkbit, LLC (US) | 2021-09-29 | — | — | EP | claimed |
| WO-2021133735-A1 | RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME | ILLUMINA, INC. (US) | 2021-07-01 | — | — | WO | claimed |
| US-20200249570-A1 | PHOTOACTIVE, INORGANIC LIGAND-CAPPED INORGANIC NANOCRYSTALS | THE UNIVERSITY OF CHICAGO | 2020-08-06 | — | — | US | claimed |
| WO-2020123479-A1 | PRECISION SYSTEM FOR ADDITIVE FABRICATION | Inkbit, LLC (US) | 2020-06-18 | — | — | WO | claimed |
| EP-3613070-A1 | PHOTOACTIVE, INORGANIC LIGAND-CAPPED INORGANIC NANOCRYSTALS | The University of Chicago (US) | 2020-02-26 | — | — | EP | claimed |
| US-20190339421-A1 | POLARIZING PLATE, METHOD FOR MANUFACTURING POLARIZING PLATE, AND OPTICAL DISPLAY DEVICE COMPRISING SAME | Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) | 2019-11-07 | — | — | US | claimed |
| US-10294310-B2 | Photocurable composition | THREE BOND CO., LTD. (JP) | 2019-05-21 | — | — | US | claimed |
| EP-1671183-B1 | PHOTOCURABLE COMPOSITIONS FOR ARTICLES HAVING STABLE TENSILE PROPERTIES | 3D SYSTEMS INC (US) | 2016-01-06 | — | — | EP | claimed |
| WO-2026100367-A1 | RESIST MATERIAL AND PATTERN FORMATION METHOD | 東京応化工業株式会社 | 2026-05-15 | — | — | WO | disclosed |
| EP-4722814-A1 | PATTERN FORMING METHOD AND PROCESSING LIQUID FOR METAL COMPOUND-CONTAINING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-4722810-A1 | RESIST MATERIAL, PATTERN FORMING METHOD, AND PATTERNED STRUCTURE | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2026-04-08 | — | — | EP | disclosed |
| JP-2003172832-A | MATERIAL FOR FORMATION OF OPTICAL WAVEGUIDE AND OPTICAL WAVEGUIDE | TOKUYAMA CORP | 2003-06-20 | — | — | JP | disclosed |
| US-20020192593-A1 | Used as chemically amplified resist, exhibits high sensitivity, resolution, radiation transmittance, and surface smoothness, and is free from the problem of partial insolublization during overexposure | JSR CORPORATION (JP) | 2002-12-19 | — | — | US | disclosed |
| EP-1238972-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR Corporation (JP) | 2002-09-11 | — | — | EP | disclosed |