SCHEMBL7558928

SCHEMBL7558928

CC(C(=O)O)=C(C)C(C)(C)C

nearest known ligand 0.39

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
FFAR3 O14843 1/20 0.35
LCK P06239 1/20 0.35
FYN P06241 1/20 0.35
ALDH1A1 P00352 1/20 0.35
TSHR P16473 1/20 0.35
THRB P10828 1/20 0.30
FNTA P49354 1/20 0.30
FNTB P49356 1/20 0.30
PGGT1B P53609 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7558925 1.00 FFAR3 (0.35) FFAR3LCKFYNALDH1A1TSHR
SCHEMBL15913280 0.75 FFAR3 (0.35) FFAR3LCKFYNALDH1A1TSHR
SCHEMBL5038782 0.75 FFAR3 (0.35) FFAR3LCKFYNALDH1A1TSHR
SCHEMBL5038778 0.75 FFAR3 (0.35) FFAR3LCKFYNALDH1A1TSHR
SCHEMBL20550221 0.75 FFAR3 (0.35) FFAR3LCKFYNALDH1A1TSHR
SCHEMBL8374042 0.73 ALDH1A1 (0.33) FFAR3LCKFYNALDH1A1TSHR
SCHEMBL6120498 0.73 ALDH1A1 (0.33) FFAR3LCKFYNALDH1A1TSHR
SCHEMBL8371327 0.73 ALDH1A1 (0.33) FFAR3LCKFYNALDH1A1TSHR
SCHEMBL71371 0.73 FFAR3 (0.33) FFAR3LCKFYN
Pivalate SCHEMBL28876895 0.73 TSHR (0.40) FFAR3LCKFYNALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5908732-A Polymer compositions for high resolution resist applications INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-06-01 US claimed
EP-1227111-A1 TRIPHENYLBORON-CONTAINING POLYMERS AND USE THEREOF Yoshitomi Fine Chemicals, Ltd. (JP) 2002-07-31 EP disclosed
US-6280903-B1 PHOTORESISTS OF NORBORNENE SUCCINIC ANHYDRIDE SAMSUNG ELECTRONICS CO., LTD. (KR) 2001-08-28 US disclosed
US-6114084-A COPOLYMERS AND TERPOLYMERS USED IN CHEMICALLY AMPLIFIED RESISTS SAMSUNG ELECTRONICS CO. LTD. (KR) 2000-09-05 US disclosed
EP-0836119-A1 Chemically amplified resist composition Samsung Electronics Co., Ltd. (KR) 1998-04-15 EP disclosed