SCHEMBL756072

SCHEMBL756072

CC1(C)CC(C(CCCCCCCC(=O)O)C(=O)O)CC(C)(C)N1O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 2/20 0.37
FFAR1 O14842 2/20 0.37
ALDH1A1 P00352 3/20 0.36
GSTK1 Q9Y2Q3 1/20 0.35
TSHR P16473 5/20 0.34
LMNA P02545 1/20 0.34
NFKB1 P19838 1/20 0.34
PMP22 Q01453 1/20 0.34
PPARG P37231 6/20 0.33
PPARD Q03181 6/20 0.33
PPARA Q07869 6/20 0.33
GPR84 Q9NQS5 5/20 0.33
HDAC11 Q96DB2 5/20 0.33
TLR2 O60603 2/20 0.33
TDP1 Q9NUW8 2/20 0.33
FABP4 P15090 2/20 0.33
PTPN1 P18031 2/20 0.33
KDM4C Q9H3R0 2/20 0.33
SLC22A6 Q4U2R8 1/20 0.33
SLC22A8 Q8TCC7 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7191030 0.94 CYP1A2 (0.34) ALDH1A1GSTK1ALOX15
SCHEMBL1019749 0.89 FFAR4 (0.41) FFAR4FFAR1ALDH1A1GSTK1TSHR
SCHEMBL26977316 0.87 GPR84 (0.41) FFAR4FFAR1PPARDGPR84
SCHEMBL26977259 0.87 GPR84 (0.41) FFAR4FFAR1PPARDGPR84
SCHEMBL26977526 0.87 GPR84 (0.41) FFAR4FFAR1PPARDGPR84
SCHEMBL755538 0.87 GPR84 (0.41) FFAR4FFAR1PPARDGPR84
SCHEMBL7509572 0.87 GPR84 (0.41) FFAR4FFAR1PPARDGPR84
SCHEMBL26977574 0.87 GPR84 (0.41) FFAR4FFAR1PPARDGPR84
SCHEMBL26977190 0.87 GPR84 (0.41) FFAR4FFAR1PPARDGPR84
SCHEMBL7636900 0.87 GPR84 (0.41) FFAR4FFAR1PPARDGPR84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4530323-A1 CURABLE COMPOSITION FOR INKJET FOR METAL-CONTAINING BASE MATERIAL, SOLDER RESIST, AND INKJET RECORDING METHOD KONICA MINOLTA, INC. (JP) 2025-04-02 EP disclosed
US-20250101247-A1 CURABLE COMPOSITION FOR INKJET FOR METAL-CONTAINING BASE MATERIAL, SOLDER RESIST, AND INKJET RECORDING METHOD Konica Minolta, Inc. (JP) 2025-03-27 US disclosed
EP-2903961-B1 CONTINUOUS PROCESS FOR THE PREPARATION OF (METH)ACRYLATES OF MIXTURES OF C10-ALCOHOLS BASF SE (DE) 2016-11-09 EP disclosed
EP-2903961-A1 CONTINUOUS METHOD FOR PRODUCING (METH)ACRYLATES FROM C10 ALCOHOL MIXTURES BASF SE (DE) 2015-08-12 EP disclosed
WO-2014053347-A1 CONTINUOUS METHOD FOR PRODUCING (METH)ACRYLATES FROM C10 ALCOHOL MIXTURES BASF SE (DE) 2014-04-10 WO disclosed
US-8349916-B2 Actinic energy radiation curable ink-jet ink, ink-jet recording method, and printed matter KONICA MINOLTA IJ TECHNOLOGIES, INC. (JP) 2013-01-08 US disclosed
EP-2228415-B1 Actinic energy radiation curable ink-jet ink, ink-jet recoring method, and printed matter KONICA MINOLTA IJ TECHNOLOGIES (JP) 2012-03-21 EP disclosed
US-20100255211-A1 ACTINIC ENERGY RADIATION CURABLE INK-JET INK AND INK-JET IMAGE FORMING METHOD KONICA MINOLTA IJ TECHNOLOGIES, INC. (JP) 2010-10-07 US disclosed
EP-2236568-A1 Actinic energy radiation curable ink-jet ink and ink-jet image forming method Konica Minolta IJ Technologies, Inc. (JP) 2010-10-06 EP disclosed
US-20100233446-A1 ACTINIC ENERGY RADIATION CURABLE INK-JET INK, INK-JET RECORDING METHOD, AND PRINTED MATTER KONICA MINOLTA IJ TECHNOLOGIES, INC. (JP) 2010-09-16 US disclosed
EP-2228415-A1 Acting energy radiation curable ink-jet ink, ink-jet recoring method, and printed matter Konica Minolta IJ Technologies, Inc. (JP) 2010-09-15 EP disclosed
WO-2007063031-A2 STABILIZED POLYMERIZABLE MIXTURES BASF AKTIENGESELLSCHAFT (DE) 2007-06-07 WO disclosed
WO-2006122923-A1 AROMATIC HETEROCYCLES AS STABILIZERS OF POLYMERIZABLE COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 2006-11-23 WO disclosed
EP-1518916-A1 Scavenger of free radicals as stabilizers of polymerisable compounds BASF AKTIENGESELLSCHAFT (DE) 2005-03-30 EP disclosed
WO-2000069793-A1 MIXTURE OF SUBSTANCES, COMPRISING STABILISERS AND COMPOUNDS WHICH CONTAIN VINYL GROUPS BASF AKTIENGESELLSCHAFT (DE) 2000-11-23 WO disclosed
EP-1034201-A1 METHOD FOR PRODUCING GRAFT POLYMERS BASF AKTIENGESELLSCHAFT (DE) 2000-09-13 EP disclosed
WO-1999060072-A1 SUBSTANCE MIXTURES WHICH COMPRISE COMPOUNDS CONTAINING VINYL GROUPS AND WHICH COMPRISE STABILIZERS BASF AKTIENGESELLSCHAFT (DE) 1999-11-25 WO disclosed
WO-1999025749-A1 METHOD FOR PRODUCING GRAFT POLYMERS BASF AKTIENGESELLSCHAFT (DE) 1999-05-27 WO disclosed
EP-0815082-A1 4-ACYLAMINO PIPERIDIN-N-OXYLS BASF AKTIENGESELLSCHAFT (DE) 1998-01-07 EP disclosed