SCHEMBL7561689

SCHEMBL7561689

CCC(C)(CO)CCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13649569 1.00
SCHEMBL1100948 0.88 TSHR (0.35)
SCHEMBL497569 0.88
SCHEMBL1650704 0.84
SCHEMBL560825 0.84 ALDH1A1 (0.33)
SCHEMBL5931138 0.83 SMN1; SMN2 (0.41)
SCHEMBL807052 0.82
SCHEMBL10557078 0.81 CYP4F2 (0.39)
SCHEMBL1456257 0.81
SCHEMBL45387 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113638219-A Preparation method of low-temperature-resistant fluorescent whitening slurry 奥仕集团有限公司 2021-11-12 CN claimed
CN-1219953-A Fabric softening compound/composition PROCTER & GAMBLE (US) 1999-06-16 CN claimed
CN-1195369-A Concentrated and stable fabric softening compositions PROCTER & GAMBLE (US) 1998-10-07 CN claimed
CN-113638219-A Preparation method of low-temperature-resistant fluorescent whitening slurry 奥仕集团有限公司 2021-11-12 CN disclosed
US-9188866-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-17 US disclosed
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-9176382-B2 Composition for forming titanium-containing resist underlayer film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-11-03 US disclosed
US-20140273448-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
WO-2010033207-A1 POLYMER CONJUGATES OF THERAPEUTIC PEPTIDES NEKTAR THERAPEUTICS (US) 2010-03-25 WO disclosed
EP-0712719-A1 A polyester laminated film Toyo Boseki Kabushiki Kaisha (JP) 1996-05-22 EP disclosed
US-5458965-A Heat-sealing; blends; for wrapping TOYO BOSEKI KABUSHIKI KAISHA (JP) 1995-10-17 US disclosed
EP-0379190-A2 A polyester laminated film Toyo Boseki Kabushiki Kaisha (JP) 1990-07-25 EP disclosed
EP-0045694-B1 TWO-SHEET DIFFUSION TRANSFER PHOTOGRAPHIC ASSEMBLAGES EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1985-05-15 EP disclosed
EP-0045693-B1 PHOTOGRAPHIC ELEMENT FOR TWO-SHEET DIFFUSION TRANSFER PHOTOGRAPHY EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1985-04-10 EP disclosed
US-4346160-A OVERCAOTING PREVENTS PREMATURE DELAMINATION EASTMAN KODAK COMPANY (US) 1982-08-24 US disclosed
EP-0045694-A2 Two-sheet diffusion transfer photographic assemblages EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1982-02-10 EP disclosed
US-4298682-A PREVENTION OF SPONTANEOUS DELAMINATION EASTMAN KODAK COMPANY (US) 1981-11-03 US disclosed
US-4297432-A CONTAINING A VINYLIDENE CHLORIDE POLYMERIC LAYER, AN ANIONIC POLYESTER LAYER AND A CATIONIC ACRYLIC ESTER OR AMIDE POLYMER LAYER EASTMAN KODAK COMPANY (US) 1981-10-27 US disclosed