SCHEMBL7561879

SCHEMBL7561879

C=COC(O)CCC(CCC)OC=C

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CTSK P43235 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36630 0.85
Ethylene Glycol SCHEMBL13387813 0.79 LMNA (0.31)
Vinyl Ether SCHEMBL3480788 0.79
SCHEMBL483567 0.77
SCHEMBL237322 0.76
Bicarbonate SCHEMBL28780632 0.76 CHRM1 (0.37) CTSK
SCHEMBL28776579 0.76
SCHEMBL441780 0.75 MAPT (0.38)
Acrylic Acid SCHEMBL28366339 0.74 LMNA (0.39)
SCHEMBL993902 0.74 SMN1; SMN2 (0.36) CTSK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020037472-A1 Novel polymers and photoresist compositions comprising labile polymer backbones for short wave imaging SHIPLEY COMPANY, L.L.C. 2002-03-28 US disclosed
WO-2002021214-A2 USE OF ACETAL/KETAL POLYMERS IN PHOTORESIST COMPOSITIONS SUITABLE FOR SHORT WAVE IMAGING SHIPLEY COMPANY, L.L.C. (US) 2002-03-14 WO disclosed
US-5917024-A Acid labile photoactive composition SHIPLEY COMPANY, L.L.C. (US) 1999-06-29 US disclosed
US-5858605-A PHOTORESIST COATING COMPRISING ALKALI SOLUBLE RESIN AND PHOTOACTIVE COMPOUND, REACTION PRODUCT OF VINYL ETHER AND ORTHO-NAPHTHOQUINONEDIAZIDE SULFONYL COMPOUND, DISSOLVED IN SOLVENT SHIPLEY COMPANY, L.L.C. (US) 1999-01-12 US disclosed