Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL7562590

O=[N+]([O-])[O-].O=[N+]([O-])[O-].[Ce].[NH4+]

nearest known ligand 0.88

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Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.88
KMT2A Q03164 1/20 0.88
CA5A P35218 1/20 0.46
CA5B Q9Y2D0 1/20 0.46
TSHR P16473 3/20 0.39
ALDH1A1 P00352 3/20 0.39
TDP1 Q9NUW8 1/20 0.39
HPGD P15428 1/20 0.36
HIF1A Q16665 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL29908 1.00
Ammonia Solution, Strong SCHEMBL2207803 1.00 MEN1 (0.88) MEN1KMT2ACA5ACA5BTSHR
Ammonia Solution, Strong SCHEMBL3871065 1.00 MEN1 (0.88) MEN1KMT2ACA5ACA5BTSHR
Ammonia Solution, Strong SCHEMBL6654677 1.00
Ammonia Solution, Strong SCHEMBL246569 1.00 MEN1 (0.88) MEN1KMT2ACA5ACA5BTSHR
Water SCHEMBL5330988 0.94
Water SCHEMBL3229367 0.94 MEN1 (0.78) MEN1KMT2ACA5ACA5BTSHR
Ammonia Solution, Strong SCHEMBL31326126 0.94
Water SCHEMBL31366015 0.94
Water SCHEMBL28983695 0.94 MEN1 (0.78) MEN1KMT2ACA5ACA5BTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-63224738-A None JP disclosed
CN-101334526-A micro-oscillation element and array of micro-oscillation elements FUJITSU LTD (JP) 2008-12-31 CN disclosed
EP-0724183-B1 Liquid crystal display device and method of fabricating the same HITACHI LTD (JP) 2002-07-31 EP disclosed
US-6407784-B1 Reflection type liquid crystal display and method of fabricating the same NEC CORPORATION (JP) 2002-06-18 US disclosed
US-6165692-A Method for manufacturing a semiconductor device and an exposure mask used therefor KABUSHIKI KAISHA TOSHIBA (JP) 2000-12-26 US disclosed
JP-2000275663-A LIQUID CRYSTAL DISPLAY DEVICE AND ITS PRODUCTION HITACHI LTD 2000-10-06 JP disclosed
US-5837405-A SEMICONDUCTORS WITH MASKING PATTERNS AND RADIATION TRANSPARENT FILMS WITH LIGHT BEAMS KABUSHIKI KAISHA TOSHIBA (JP) 1998-11-17 US disclosed
US-5777702-A Liquid crystal display device and method of fabricating the same by patterning semiconductor, insulator, and gatelines with single mask HITACHI, LTD. (JP) 1998-07-07 US disclosed
US-5660956-A SEMI-TRANSPARENT FILM FOR CAUSING PHASE SHIFTING, THE LITHOGRAPHIC LIGHT INTENSITY SHARPENING KABUSHIKI KAISHA TOSHIBA (JP) 1997-08-26 US disclosed
US-5595844-A Method of exposing light in a method of fabricating a reticle KABUSHIKI KAISHA TOSHIBA (JP) 1997-01-21 US disclosed
US-5589305-A SEMICONDUCTORS KABUSHIKI KAISHA TOSHIBA (JP) 1996-12-31 US disclosed
EP-0724183-A2 Liquid crystal display device and method of fabricating the same HITACHI, LTD. (JP) 1996-07-31 EP disclosed
JP-S63224738-A PRODUCTION OF RUTHENIUM DIOXIDE CARRING CATALYST JOHOKU KAGAKU KOGYO KK 1988-09-19 JP disclosed