Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL159727 | 0.98 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL14482197 | 0.98 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL5885379 | 0.98 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL10521389 | 0.98 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL17272779 | 0.98 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL5884497 | 0.98 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL151197 | 0.98 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL152860 | 0.98 | TSHR (0.39) | TSHRALDH1A1THRB | |
| SCHEMBL4122914 | 0.91 | TSHR (0.44) | TSHRALDH1A1THRB | |
| SCHEMBL130199 | 0.89 | TSHR (0.42) | TSHRALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2103592-B1 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-06-03 | — | — | EP | disclosed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-20120108043-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120108043-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-8129100-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-8129100-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-8053165-B2 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-08 | — | — | US | disclosed |
| US-20090253084-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090253084-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090239179-A1 | HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-24 | — | — | US | disclosed |
| EP-2103592-A2 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-09-23 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090239179-A1 | HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | RAD51, REV1, H1-0 | TSHR 2056/4885ALDH1A1 774/4885THRB 2973/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.