SCHEMBL7568686

SCHEMBL7568686

O=[C]OCCOCCCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7571482 1.00 ALDH1A1 (0.31)
SCHEMBL6570936 0.86 MEN1 (0.32)
SCHEMBL95061 0.86
SCHEMBL14480100 0.79
SCHEMBL20357702 0.76 ALDH1A1 (0.41)
SCHEMBL1447159 0.76 ALDH1A1 (0.41)
SCHEMBL525705 0.76 ALDH1A1 (0.41)
SCHEMBL8117603 0.76 ALDH1A1 (0.41)
SCHEMBL20450717 0.76 ALDH1A1 (0.41)
SCHEMBL44786 0.76 ALDH1A1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1179241-C Photographic silver halide photosensitive material 富士胶片公司 2004-12-08 CN disclosed
EP-0457153-B1 Method for processing a silver halide photographic material FUJI PHOTO FILM CO LTD (JP) 2002-09-18 EP disclosed
CN-1180847-A Photographic silver halide photosensitive material FUJI PHOTO FILM CO LTD (JP) 1998-05-06 CN disclosed
EP-0456163-B1 Silver halide photographic materials FUJI PHOTO FILM CO LTD (JP) 1997-08-06 EP disclosed
EP-0423693-B1 Silver halide color photographic material FUJI PHOTO FILM CO LTD (JP) 1997-04-09 EP disclosed
EP-0391405-B1 Silver halide photographic material and method for processing thereof FUJI PHOTO FILM CO LTD (JP) 1997-01-15 EP disclosed
US-5573899-A TELLURIUM SENSITIZED, MERCAPTO-SUBSTITUTED TRIAZOLES, TETRAZOLES OR THIADIAZOLES FUJI PHOTO FILM CO., LTD. (JP) 1996-11-12 US disclosed
EP-0337490-B1 Silver halide light-sensitive photographic material FUJI PHOTO FILM CO LTD (JP) 1995-12-20 EP disclosed
EP-0610936-A2 Lithographic printing material FUJI PHOTO FILM CO., LTD. (JP) 1994-08-17 EP disclosed
US-5298192-A Scratch resistance FUJI PHOTO FILM CO., LTD. (JP) 1994-03-29 US disclosed
US-5232825-A Scratch resistant, high speed processability; image quality FUJI PHOTO FILM CO., LTD. (JP) 1993-08-03 US disclosed
US-5098818-A Multilayer photographic films FUJI PHOTO FILM CO., LTD. (JP) 1992-03-24 US disclosed
US-5079134-A X-ray film with improved sharpness, reduced crossover, dye which absorbs in sensitive region of silver halide emulsion FUJI PHOTO FILM CO., LTD. (JP) 1992-01-07 US disclosed
EP-0457153-A1 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1991-11-21 EP disclosed
EP-0456163-A2 Silver halide photographic materials FUJI PHOTO FILM CO., LTD. (JP) 1991-11-13 EP disclosed
EP-0423742-A2 Silver halide color reversal photographic photosensitive material FUJI PHOTO FILM CO., LTD. (JP) 1991-04-24 EP disclosed
EP-0423693-A2 Silver halide color photographic material FUJI PHOTO FILM CO., LTD. (JP) 1991-04-24 EP disclosed
EP-0337490-A2 Silver halide light-sensitive photographic material Fuji Photo Film Co., Ltd. (JP) 1989-10-18 EP disclosed
US-4487781-A HEAT RESISTANCE; PHOTOSTABILITY SANKYO COMPANY LIMITED (JP) 1984-12-11 US disclosed
US-4259350-A PROTECTING DEGRADABLE ORGANIC MATERIAL FROM FUNGAL OR INSECT ATTACK SANKYO COMPANY LIMITED (JP) 1981-03-31 US disclosed