⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7591208 | 0.74 | — | — | |
| SCHEMBL853365 | 0.69 | — | — | |
| SCHEMBL14336269 | 0.65 | — | — | |
| SCHEMBL9805978 | 0.65 | — | — | |
| SCHEMBL8914655 | 0.63 | NPC1 (0.30) | — | |
| SCHEMBL7168628 | 0.63 | TSHR (0.35) | — | |
| SCHEMBL857506 | 0.62 | — | — | |
| SCHEMBL14822860 | 0.62 | — | — | |
| SCHEMBL6753813 | 0.62 | — | — | |
| SCHEMBL3394984 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20020052447-A1 | Rubber-containing sytrenic resin and process for producing the same | DAICEL CHEMICAL INDUSTRIES, LTD. | 2002-05-02 | — | — | US | disclosed |
| US-6333381-B1 | MORPHOLOGY AND THE PARTICLE SIZE OF RUBBER PARTICLES DISPERSED IN A STYRENIC RESIN ARE CONTROLLABLE; IMPROVING THE IMPACT RESISTANCE; SURFACE GLOSS; GRAFT POLYMERS; | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2001-12-25 | — | — | US | disclosed |
| EP-1002812-A1 | Rubber-containing styrenic resin and process for producing the same | Daicel Chemical Industries, Ltd. (JP) | 2000-05-24 | — | — | EP | disclosed |