SCHEMBL7571718

SCHEMBL7571718

CCCC(C)(CC)N=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19365009 0.82 FDPS (0.40)
SCHEMBL7571167 0.82
SCHEMBL13003742 0.79 FDPS (0.37)
SCHEMBL10013847 0.77 FDPS (0.40)
SCHEMBL185860 0.77 TSHR (0.33)
SCHEMBL1253156 0.77 TSHR (0.33)
SCHEMBL5932941 0.77 TSHR (0.33)
SCHEMBL20388294 0.72 FDPS (0.39)
SCHEMBL17085826 0.72
SCHEMBL1678828 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150094679-A1 ABSORBENT ARTICLE WITH PHILIC ANHYDROUS LOTION PROCTER & GAMBLE (US) 2015-04-02 US disclosed
US-20020052447-A1 Rubber-containing sytrenic resin and process for producing the same DAICEL CHEMICAL INDUSTRIES, LTD. 2002-05-02 US disclosed
US-6333381-B1 MORPHOLOGY AND THE PARTICLE SIZE OF RUBBER PARTICLES DISPERSED IN A STYRENIC RESIN ARE CONTROLLABLE; IMPROVING THE IMPACT RESISTANCE; SURFACE GLOSS; GRAFT POLYMERS; DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2001-12-25 US disclosed
EP-1002812-A1 Rubber-containing styrenic resin and process for producing the same Daicel Chemical Industries, Ltd. (JP) 2000-05-24 EP disclosed