SCHEMBL7571840

SCHEMBL7571840

CC(C)OC(=O)/C=C/C(=O)OC(C)(C)C.CC(C)OC(=O)/C=C/C(=O)OC(C)C

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 3/20 0.59
CA1 P00915 2/20 0.42
CA2 P00918 2/20 0.42
CA7 P43166 2/20 0.42
CA12 O43570 1/20 0.42
AKR1B10 O60218 1/20 0.42
AKR1B1 P15121 1/20 0.42
CA9 Q16790 1/20 0.42
CA14 Q9ULX7 1/20 0.42
TSHR P16473 1/20 0.37
KDM4E B2RXH2 1/20 0.34
GLA P06280 1/20 0.34
MAPT P10636 1/20 0.34
HTT P42858 1/20 0.34
RECQL P46063 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
LMNA P02545 3/20 0.34
ALDH1A1 P00352 1/20 0.34
CYP3A4 P08684 1/20 0.34
TDP1 Q9NUW8 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7571847 1.00 HCAR2 (0.59) HCAR2CA1CA2CA7CA12
SCHEMBL7536978 1.00 HCAR2 (0.59) HCAR2CA1CA2CA7CA12
SCHEMBL3514185 1.00 HCAR2 (0.59) HCAR2CA1CA2CA7CA12
SCHEMBL177748 0.83 HCAR2 (0.80) HCAR2CA1CA2CA7CA12
SCHEMBL375029 0.83 HCAR2 (0.45) HCAR2HTTSMN1; SMN2LMNAALDH1A1
SCHEMBL177747 0.83 HCAR2 (0.80) HCAR2CA1CA2CA7CA12
SCHEMBL43764 0.83 HCAR2 (0.45) HCAR2HTTSMN1; SMN2LMNAALDH1A1
SCHEMBL178194 0.83 HCAR2 (0.80) HCAR2CA1CA2CA7CA12
SCHEMBL43004 0.83 HCAR2 (0.45) HCAR2HTTSMN1; SMN2LMNAALDH1A1
SCHEMBL27659116 0.81 HCAR2 (0.76) HCAR2CA1CA2CA7CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020190818-A1 High frequency band pass filter TDK CORPORATION (JP) 2002-12-19 US disclosed
EP-0788118-B1 Low dielectric polymer and film, substrate and electronic part using the same TDK CORP (JP) 2002-11-20 EP disclosed
US-5914283-A FUMARIC ACID DIESTER MONOMER-CONTAINING POLYMER FILM; HEAT RESISTANCE, WEATHER RESISTANCE TDK CORPORATION (JP) 1999-06-22 US disclosed
EP-0788118-A1 Low dielectric polymer and film, substrate and electronic part using the same TDK Corporation (JP) 1997-08-06 EP disclosed