Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.62 |
| ▸ | CA9 | Q16790 | 3/20 | 0.60 |
| ▸ | CA1 | P00915 | 3/20 | 0.60 |
| ▸ | CA2 | P00918 | 3/20 | 0.60 |
| ▸ | CA4 | P22748 | 3/20 | 0.60 |
| ▸ | CA12 | O43570 | 2/20 | 0.60 |
| ▸ | CA6 | P23280 | 2/20 | 0.60 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.60 |
| ▸ | CA5A | P35218 | 1/20 | 0.60 |
| ▸ | CA7 | P43166 | 1/20 | 0.60 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.60 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.60 |
| ▸ | HTR6 | P50406 | 1/20 | 0.54 |
| ▸ | KYNU | Q16719 | 2/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | CASP1 | P29466 | 1/20 | 0.41 |
| ▸ | CASP7 | P55210 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | TTR | P02766 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14834096 | 0.87 | GAA (0.48) | GAACA9CA1CA2CA4 | |
| SCHEMBL10921984 | 0.87 | GAA (0.48) | GAACA9CA1CA2CA4 | |
| SCHEMBL10922221 | 0.87 | GAA (0.48) | GAACA9CA1CA2CA4 | |
| SCHEMBL7055443 | 0.84 | GAA (0.60) | GAACA9CA1CA2CA4 | |
| SCHEMBL3864767 | 0.82 | LMNA (0.50) | GAACA9CA1CA2CA4 | |
| SCHEMBL1459150 | 0.82 | GAA (0.58) | GAACA9CA1CA2CA4 | |
| Methane SCHEMBL9696174 | 0.82 | GAA (0.58) | GAACA9CA1CA2CA4 | |
| SCHEMBL28573134 | 0.80 | GAA (0.46) | GAACA9CA1CA2CA4 | |
| SCHEMBL8779870 | 0.79 | GAA (0.54) | GAACA9CA1CA2CA4 | |
| SCHEMBL534724 | 0.79 | GAA (0.54) | GAACA9CA1CA2CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024029475-A1 | WAVELENGTH CONVERSION FILM FORMING COMPOSITION | 日産化学株式会社 | 2024-02-08 | — | — | WO | disclosed |
| WO-2023140170-A1 | RING-FUSED THIOPHENE COMPOUND, AND COMPOSITION FOR WAVELENGTH CONVERSION FILM FORMATION USE WHICH CONTAINS SAME | 国立大学法人東海国立大学機構 | 2023-07-27 | — | — | WO | disclosed |
| WO-2023100809-A1 | WAVELENGTH CONVERSION FILM FORMING COMPOSITION | 日産化学株式会社 | 2023-06-08 | — | — | WO | disclosed |
| US-11319514-B2 | Composition for forming a coating film for removing foreign matters | NISSAN CHEMICAL CORPORATION (JP) | 2022-05-03 | — | — | US | disclosed |
| US-20200140792-A1 | COMPOSITION FOR FORMING A COATING FILM FOR REMOVING FOREIGN MATTERS | NISSAN CHEMICAL CORPORATION (JP) | 2020-05-07 | — | — | US | disclosed |
| CN-110537146-A | Photosensitive resin composition | NISSAN CHEMICAL CORP | 2019-12-03 | — | — | CN | disclosed |
| CN-110537147-A | Photosensitive polymer combination | NISSAN CHEMICAL IND LTD | 2019-12-03 | — | — | CN | disclosed |
| CN-110366768-A | The composition for forming coating removed for foreign matter | 日产化学株式会社 | 2019-10-22 | — | — | CN | disclosed |
| US-20190214145-A1 | Method and systems for creating and screening patient metabolite profile to diagnose current medical condition, diagnose current treatment state and recommend new treatment regimen | KUREK ITZHAK (US) | 2019-07-11 | — | — | US | disclosed |
| CN-108475016-A | Positive type photosensitive organic compound | 日产化学工业株式会社 | 2018-08-31 | — | — | CN | disclosed |
| CN-101040221-B | Composition for forming bottom anti-reflective coating containing aromatic sulfonic acid ester compound and light photoacid-generating agent | NISSAN CHEMICAL IND LTD | 2010-06-16 | — | — | CN | disclosed |
| CN-101517492-A | Method for producing transparent cured film using positive photosensitive resin layer for half exposure | NISSAN CHEMICAL IND LTD (JP) | 2009-08-26 | — | — | CN | disclosed |
| CN-101467100-A | Positive photosensitive resin composition containing polymer having ring structure | NISSAN CHEMICAL IND LTD (JP) | 2009-06-24 | — | — | CN | disclosed |
| CN-101065708-A | Method for forming photoresist pattern using double layer antireflection film | NISSAN CHEMICAL IND LTD (JP) | 2007-10-31 | — | — | CN | disclosed |
| CN-101040221-A | Composition for forming bottom anti-reflective coating containing aromatic sulfonic acid ester compound and light photoacid-generating agent | NISSAN CHEMICAL IND LTD (JP) | 2007-09-19 | — | — | CN | disclosed |
| CN-1223901-C | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL IND LTD (JP) | 2005-10-19 | — | — | CN | disclosed |
| CN-1208683-C | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL IND LTD (JP) | 2005-06-29 | — | — | CN | disclosed |
| CN-1468391-A | Positive photosensitive polyimide resin composition | �ղ���ѧ��ҵ��ʽ���� | 2004-01-14 | — | — | CN | disclosed |
| CN-1402841-A | Positive type photosensitive polyimide resin composition | NISSAN CHEMICAL IND LTD (JP) | 2003-03-12 | — | — | CN | disclosed |
| EP-1241527-A1 | POSITIVE TYPE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2002-09-18 | — | — | EP | disclosed |