⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8205953 | 0.67 | — | — | |
| Methylene Chloride SCHEMBL1154217 | 0.61 | — | — | |
| Methylene Chloride SCHEMBL18247337 | 0.61 | — | — | |
| Methylene Chloride SCHEMBL1332597 | 0.61 | — | — | |
| Methylene Chloride SCHEMBL7293016 | 0.61 | — | — | |
| Methylene Chloride SCHEMBL8546647 | 0.61 | — | — | |
| Methylene Chloride SCHEMBL493 | 0.61 | — | — | |
| Methylene Chloride SCHEMBL11835547 | 0.55 | — | — | |
| Methylene Chloride SCHEMBL4859310 | 0.55 | ALDH1A1 (0.80) | — | |
| Methylene Chloride SCHEMBL3171834 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-62299965-A | — | — | None | — | — | JP | disclosed |
| CN-114269761-A | Novel silylcyclodisilazane compound and method for manufacturing silicon-containing film using the same | DNF有限公司 | 2022-04-01 | — | — | CN | disclosed |
| WO-2021034014-A1 | NOVEL SILYLCYCLODISILAZANE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME | DNF CO., LTD. (KR) | 2021-02-25 | — | — | WO | disclosed |
| EP-2743249-B1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-07-24 | — | — | EP | disclosed |
| EP-2911002-B1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-07-17 | — | — | EP | disclosed |
| EP-3007004-B1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-17 | — | — | EP | disclosed |
| US-20180074404-A1 | RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-03-15 | — | — | US | disclosed |
| EP-3279731-A1 | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| US-9785048-B2 | Resist composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-10-10 | — | — | US | disclosed |
| US-9746769-B2 | — | — | 2017-08-29 | — | — | US | disclosed |
| US-20140308615-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-10-16 | — | — | US | disclosed |
| EP-2781504-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-09-24 | — | — | EP | disclosed |
| EP-2781501-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-09-24 | — | — | EP | disclosed |
| CN-103958455-A | Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern | MITSUBISHI GAS CHEMICAL CO | 2014-07-30 | — | — | CN | disclosed |
| CN-103946204-A | Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern | MITSUBISHI GAS CHEMICAL CO | 2014-07-23 | — | — | CN | disclosed |
| EP-2743249-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-06-18 | — | — | EP | disclosed |
| CN-103717562-A | Cyclic compound, method for producing same, composition, and method for forming resist pattern | MITSUBISHI GAS CHEMICAL CO | 2014-04-09 | — | — | CN | disclosed |
| JP-2002080481-A | SILANE COUPLING AGENT | OKAMOTO KAGAKU KOGYO KK | 2002-03-19 | — | — | JP | disclosed |
| CN-1291350-A | Receiving device for trapping ions | COMBIMATRIX CORP (US) | 2001-04-11 | — | — | CN | disclosed |
| JP-S62299965-A | NEGATIVE TYPE RESIST COMPOSITION | FUJITSU LTD | 1987-12-26 | — | — | JP | disclosed |