SCHEMBL75851

SCHEMBL75851

OCC1CC2CC1C1C3CCC(C3)C21

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26935269 1.00
SCHEMBL21185617 0.89 SI (0.31)
SCHEMBL18662522 0.89 SI (0.31)
SCHEMBL18662508 0.86 SI (0.30)
SCHEMBL19881038 0.83
SCHEMBL29321393 0.81 SI (0.30)
SCHEMBL19881044 0.80
SCHEMBL5837492 0.79
SCHEMBL19881029 0.79
SCHEMBL16441096 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240228412-A1 PRODUCTION METHOD FOR PRODUCING DIMETHANOL COMPOUND HAVING NORBORNANE SKELETON MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-07-11 US disclosed
US-20230399510-A1 THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-12-14 US disclosed
US-11732088-B2 Polyester carbonate resin and optical lens MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-08-22 US disclosed
US-20230235117-A1 RESIN COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-07-27 US disclosed
US-20230236340-A1 OPTICAL FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-07-27 US disclosed
WO-2023100777-A1 POLYCARBONATE RESIN COMPOSITION AND OPTICAL LENS USING SAME 三菱瓦斯化学株式会社 2023-06-08 WO disclosed
US-20220135736-A1 POLYESTER CARBONATE RESIN, AND MOLDED BODY WHICH IS OBTAINED BY MOLDING RESIN COMPOSITION CONTAINING RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-05-05 US disclosed
US-10913848-B2 Polycarbonate resin composition and optical lens using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-09 US disclosed
US-20200224025-A1 POLYCARBONATE RESIN COMPOSITION AND OPTICAL LENS USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-07-16 US disclosed
US-9975843-B2 Bifunctional compound having norbornane skeleton and method for producing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-05-22 US disclosed
US-20150253673-A1 PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed
US-8198016-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-12 US disclosed
US-8129100-B2 Double patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-8129100-B2 Double patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-06 US disclosed
US-7682665-B2 Durable coating compositions containing novel aspartic amine compounds E.I. DU PONT DE NEMOURS AND COMPANY (US) 2010-03-23 US disclosed
US-7674499-B2 Durable coating compositions containing novel aspartic amine compounds E.I. DU PONT DE NEMOURS AND COMPANY (US) 2010-03-09 US disclosed
US-20090286188-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed
US-20090253084-A1 DOUBLE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-08 US disclosed
US-20090253084-A1 DOUBLE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-08 US disclosed
US-7214828-B2 Durable coating compositions containing novel aspartic amine compounds E. I. DUPONT DE NEMOURS AND COMPANY (US) 2007-05-08 US disclosed