Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.40 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.40 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2695530 | 1.00 | HCAR2 (0.40) | HCAR2KEAP1NFE2L2ALDH1A1SMN1; SMN2 | |
| SCHEMBL2695526 | 1.00 | HCAR2 (0.40) | HCAR2KEAP1NFE2L2ALDH1A1SMN1; SMN2 | |
| SCHEMBL7593497 | 0.79 | HCAR2 (0.34) | HCAR2KEAP1NFE2L2 | |
| SCHEMBL1471435 | 0.78 | ALDH1A1 (0.30) | ALDH1A1 | |
| SCHEMBL30018076 | 0.78 | ALDH1A1 (0.30) | ALDH1A1 | |
| SCHEMBL699911 | 0.78 | ALDH1A1 (0.30) | ALDH1A1 | |
| SCHEMBL9588257 | 0.78 | — | — | |
| SCHEMBL8822877 | 0.78 | — | — | |
| SCHEMBL8983231 | 0.78 | — | — | |
| SCHEMBL3968549 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0855621-B1 | Manufacturing method and apparatus for semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2002-04-17 | — | — | EP | disclosed |
| EP-0837369-B1 | Pattern formation method and surface treatment agent | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-6174650-B1 | FORMING RESIST FILM IN CLEAN ROOM BY CONDUCTING SURFACE TREATMENT ON SEMICONDUCTOR SUBSTRATE WITH SILANE COMPOUND; COATING SEMICONDUCTOR SUBSTRATE WITH CHEMICALLY AMPLIFIED RESIST; EXPOSING AND DEVELOPING | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2001-01-16 | — | — | US | disclosed |
| US-6133465-A | IMPROVING THE ADHESION BETWEEN A SEMICONDUCTOR SUBSTRATE AND A RESIST PATTERN AS WELL AS PREVENTING AN INSOLUBLE SKIN LAYER FROM BEING FORMED ON THE SURFACE OF A RESIST PATTERN IN USING A CHEMICALLY AMPLIFIED RESIST | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2000-10-17 | — | — | US | disclosed |
| US-6074804-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2000-06-13 | — | — | US | disclosed |
| EP-0889367-A1 | Method for forming a photoresist pattern | Matsushita Electric Industrial Co., Ltd. (JP) | 1999-01-07 | — | — | EP | disclosed |
| EP-0855621-A2 | Manufacturing method and apparatus for semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1998-07-29 | — | — | EP | disclosed |
| EP-0855622-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1998-07-29 | — | — | EP | disclosed |
| EP-0837369-A1 | Pattern formation method and surface treatment agent | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1998-04-22 | — | — | EP | disclosed |