SCHEMBL7594063

SCHEMBL7594063

CC1(C=O)CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9061537 1.00
Water SCHEMBL10607772 0.97
SCHEMBL2657307 0.81 KCNA4 (0.31)
SCHEMBL14961837 0.75
SCHEMBL11182883 0.74 POLB (0.31)
SCHEMBL15628051 0.73
SCHEMBL5789284 0.71
SCHEMBL2321561 0.69
SCHEMBL20054503 0.67
SCHEMBL10135578 0.67 KCNA4 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230331700-A1 COMPOUND HAVING CYCLIC STRUCTURE DAIICHI SANKYO COMPANY, LIMITED (JP) 2023-10-19 US disclosed
US-9219123-B2 Method of producing a nitride semiconductor crystal with precursor containing carbon and oxygen, and nitride semiconductor crystal and semiconductor device made by the method SHARP KABUSHIKI KAISHA (JP) 2015-12-22 US disclosed
US-20140145202-A1 NITRIDE SEMICONDUCTOR CRYSTAL SHARP KABUSHIKI KAISHA (JP) 2014-05-29 US disclosed
CN-101812142-B Double functionalized aromatic ketone compounds and photoinitiator containing same SHENZHEN YOUWEI CHEMICAL TECHNOLOGY CO LTD 2012-12-26 CN disclosed
CN-101812142-A Double functionalized aromatic ketone compounds and photoinitiator containing same SHENZHEN YOUWEI CHEMICAL TECHNOLOGY CO LTD 2010-08-25 CN disclosed
EP-1868977-B1 PRODUCTION OF (CO)SURFACTANTS BY REACTING POLYOLS WITH OLEFINS BASF SE (DE) 2009-10-14 EP disclosed
CN-1125375-C Waterless lithographic plate TORAY INDUSTRIES (JP) 2003-10-22 CN disclosed
CN-1093801-C Direct drawing type waterless planographic original form plate TORAY INDUSTRIES (JP) 2002-11-06 CN disclosed
EP-0802067-B1 DIRECT DRAWING TYPE WATERLESS PLANOGRAPHIC ORIGINAL FORM PLATE TORAY INDUSTRIES (JP) 2002-04-24 EP disclosed
US-6096476-A DIRECTLY IMAGEABLE RAW PLATE HAVING A HEAT INSULATING LAYER, HEAT SENSITIVE LAYER COMPRISING A LIGHT TO HEAT CONVERTING MATERIAL AND INK REPLELLENT LAYER IN THIS ORDER ON SUBSTRATE; PLATE HAS SPECIFIED ELASTIC MODULUS AND TENSILE PROPERTIES TORAY INDUSTRIES, INC. (JP) 2000-08-01 US disclosed
EP-0678785-B1 DRY LITHOGRAPHIC PLATE TORAY INDUSTRIES (JP) 2000-05-10 EP disclosed
EP-0672950-B1 WATERLESS LITHOGRAPHIC PLATE TORAY INDUSTRIES (JP) 1999-11-24 EP disclosed
US-5866294-A HIGH DURABLE PRINTING TORAY INDUSTRIES, INC. (JP) 1999-02-02 US disclosed
US-5811210-A PHOTOSENSITIVE LAYER AND SILICONE RUBBER LAYER LAMINATED IN ORDER ONTO A SUBSTRATE; PEEL BONDING STRENGTH AND ELASTIC MODULUS; FOR WEB OFFSET AND NEWSPAPER OFFSET PRINTING DURABILITY TORAY INDUSTRIES, INC. (JP) 1998-09-22 US disclosed
CN-1177947-A Direct drawing type waterless planographic original form plate TORAY INDUSTRIES (JP) 1998-04-01 CN disclosed
EP-0802067-A1 DIRECT DRAWING TYPE WATERLESS PLANOGRAPHIC ORIGINAL FORM PLATE TORAY INDUSTRIES, INC. (JP) 1997-10-22 EP disclosed
CN-1115187-A Waterless lithographic plate TORAY INDUSTRIES (JP) 1996-01-17 CN disclosed
EP-0678785-A1 DRY LITHOGRAPHIC FORME TORAY INDUSTRIES, INC. (JP) 1995-10-25 EP disclosed
EP-0672950-A1 WATERLESS LITHOGRAPHIC PLATE TORAY INDUSTRIES, INC. (JP) 1995-09-20 EP disclosed