Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.31 |
| ▸ | LCK | P06239 | 1/20 | 0.31 |
| ▸ | FYN | P06241 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL32678 | 0.89 | — | — | |
| SCHEMBL1200848 | 0.89 | ALDH1A1 (0.50) | ALDH1A1TSHRTP53TDP1 | |
| Ethylene SCHEMBL2199923 | 0.85 | — | — | |
| SCHEMBL11125850 | 0.85 | ALDH1A1 (0.47) | ALDH1A1TSHRTP53TDP1 | |
| SCHEMBL2339546 | 0.85 | — | — | |
| Water SCHEMBL23879217 | 0.85 | — | — | |
| Formaldehyde SCHEMBL23142310 | 0.85 | — | — | |
| Methyl Alcohol SCHEMBL6914031 | 0.85 | — | — | |
| Methane SCHEMBL756364 | 0.85 | — | — | |
| SCHEMBL11551884 | 0.85 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0067067-B1 | DRY-DEVELOPING NEGATIVE RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-09-25 | — | — | EP | claimed |
| US-4464455-A | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1984-08-07 | — | — | US | claimed |
| EP-0067067-A2 | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | claimed |
| CN-106680431-A | Method and device for detecting quality of air in vehicle | 北京新能源汽车股份有限公司 | 2017-05-17 | — | — | CN | disclosed |
| CN-206033622-U | Is silver aldehyde forebody to isobutyl group beta chlorine alpha apparatus for producing of methyl phenylpropyl alcohol olefine aldehydr | 安徽华业香料股份有限公司 | 2017-03-22 | — | — | CN | disclosed |
| US-8815472-B2 | Volume hologram optical recording medium, composition for volume hologram recording layer formation, and volume hologram recording material | MITSUBISHI CHEMICAL CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| EP-2077471-B1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR VOLUME HOLOGRAM RECORDING LAYER FORMATION, AND VOLUME HOLOGRAM RECORDING MATERIAL | MITSUBISHI CHEM CORP (JP) | 2012-07-25 | — | — | EP | disclosed |
| EP-2063324-B1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR FORMING VOLUME HOLOGRAM RECORDING LAYER, VOLUME HOLOGRAM RECORDING MATERIAL, AND VOLUME HOLOGRAM OPTICAL RECORDING METHOD | MITSUBISHI CHEM CORP (JP) | 2012-03-21 | — | — | EP | disclosed |
| US-20100067073-A1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR VOLUME HOLOGRAM RECORDING LAYER FORMATION, AND VOLUME HOLOGRAM RECORDING MATERIAL | MITSUBISHI CHEMICAL CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100039685-A1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR FORMING VOLUME HOLOGRAM RECORDING LAYER, VOLUME HOLOGRAM RECORDING MATERIAL, AND VOLUME HOLOGRAM OPTICAL RECORDING METHOD | MITSUBISHI CHEMICAL CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| EP-2077471-A1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR VOLUME HOLOGRAM RECORDING LAYER FORMATION, AND VOLUME HOLOGRAM RECORDING MATERIAL | Mitsubishi Chemical Corporation (JP) | 2009-07-08 | — | — | EP | disclosed |
| EP-0573023-B1 | Method for manufacturing liquid jet recording head | CANON KK (JP) | 1998-12-30 | — | — | EP | disclosed |
| US-5458254-A | Method for manufacturing liquid jet recording head | CANON KABUSHIKI KAISHA (JP) | 1995-10-17 | — | — | US | disclosed |
| EP-0573023-A1 | Method for manufacturing liquid jet recording head | CANON KABUSHIKI KAISHA (JP) | 1993-12-08 | — | — | EP | disclosed |
| EP-0140240-B1 | PROCESS FOR FORMING AN ORGANIC THIN FILM | HITACHI, LTD. (JP) | 1988-07-06 | — | — | EP | disclosed |
| US-4604294-A | VACUUM VAPOR DEPOSITION | HITACHI, LTD. (JP) | 1986-08-05 | — | — | US | disclosed |
| EP-0067067-B1 | DRY-DEVELOPING NEGATIVE RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-09-25 | — | — | EP | disclosed |
| EP-0140240-A1 | Process for forming an organic thin film | HITACHI, LTD. (JP) | 1985-05-08 | — | — | EP | disclosed |
| US-4464455-A | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1984-08-07 | — | — | US | disclosed |
| EP-0067067-A2 | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | disclosed |