Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.54 |
| ▸ | NPC1 | O15118 | 1/20 | 0.54 |
| ▸ | PKM | P14618 | 1/20 | 0.54 |
| ▸ | RAB9A | P51151 | 1/20 | 0.54 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.37 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.37 |
| ▸ | RYR2 | Q92736 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | FABP7 | O15540 | 1/20 | 0.34 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.34 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.34 |
| ▸ | MMP3 | P08254 | 1/20 | 0.33 |
| ▸ | MMP8 | P22894 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31316696 | 1.00 | MAPT (0.54) | MAPTNPC1PKMRAB9AGAA | |
| SCHEMBL12649849 | 0.83 | MAPT (0.39) | MAPTNPC1PKMRAB9AGAA | |
| SCHEMBL12920705 | 0.83 | ALDH1A1 (0.45) | MAPTNPC1PKMRAB9AGAA | |
| SCHEMBL30988910 | 0.81 | MAPT (0.44) | MAPTNPC1PKMRAB9AGAA | |
| SCHEMBL8464052 | 0.81 | MAPT (0.44) | MAPTNPC1PKMRAB9AGAA | |
| SCHEMBL7982049 | 0.79 | ALDH1A1 (0.39) | MAPTNPC1PKMRAB9AGAA | |
| SCHEMBL15562919 | 0.79 | ALDH1A1 (0.39) | MAPTNPC1PKMRAB9AGAA | |
| SCHEMBL10443672 | 0.79 | HSD17B10 (0.39) | MAPTNPC1PKMRAB9ARYR2 | |
| SCHEMBL2171598 | 0.77 | MAPT (0.50) | MAPTNPC1PKMRAB9AALDH1A1 | |
| SCHEMBL25096198 | 0.76 | FABP7 (0.43) | NPC1RAB9AALDH1A1SMN1; SMN2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0690054-B1 | 1-Amino-2-cyclohexene derivatives and production process therefor | KURARAY CO (JP) | 2002-11-20 | — | — | EP | claimed |
| US-5587486-A | CONDENSATION; CARBONYLATION; HYDROLYSIS; INTERMEDIATES IN THE PRODUCTION OF MEDICINAL AND AGRICULTURAL AGENTS | KURARAY CO., LTD. (JP) | 1996-12-24 | — | — | US | claimed |
| EP-0690054-A1 | 1-Amino-2-cyclohexene derivatives and production process therefor | KURARAY CO., LTD. (JP) | 1996-01-03 | — | — | EP | claimed |
| CN-119908189-A | Perovskite solar cell, photovoltaic module, photovoltaic system and electricity utilization device | 宁德时代新能源科技股份有限公司 | 2025-04-29 | — | — | CN | disclosed |
| WO-2024229743-A1 | PEROVSKITE SOLAR CELL, PHOTOVOLTAIC MODULE, PHOTOVOLTAIC SYSTEM AND ELECTRICAL APPARATUS | 宁德时代新能源科技股份有限公司 | 2024-11-14 | — | — | WO | disclosed |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-01-16 | — | — | US | disclosed |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-01-16 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20220011665-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION-CONTROLLING AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-01-13 | — | — | US | disclosed |
| US-11187980-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-30 | — | — | US | disclosed |
| US-20210302838-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-30 | — | — | US | disclosed |
| US-20120258964-A1 | 2-HETEROARYL CARBOXAMIDES | BAYER SCHERING PHARMA AG (DE) | 2012-10-11 | — | — | US | disclosed |
| US-20120202153-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20120202153-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20110263591-A1 | 2-HETEROARYL CARBOXAMIDES | BAYER SCHERING PHARMA AG (DE) | 2011-10-27 | — | — | US | disclosed |
| US-7795453-B2 | Azabicyclic carbamates and their use as alpha-7 nicotinic acetylcholine receptor agonists | BAYER SCHERING PHARMA AKTIENGESELLSCHAFT (DE) | 2010-09-14 | — | — | US | disclosed |
| EP-0690054-B1 | 1-Amino-2-cyclohexene derivatives and production process therefor | KURARAY CO (JP) | 2002-11-20 | — | — | EP | disclosed |
| US-5587486-A | CONDENSATION; CARBONYLATION; HYDROLYSIS; INTERMEDIATES IN THE PRODUCTION OF MEDICINAL AND AGRICULTURAL AGENTS | KURARAY CO., LTD. (JP) | 1996-12-24 | — | — | US | disclosed |
| EP-0690054-A1 | 1-Amino-2-cyclohexene derivatives and production process therefor | KURARAY CO., LTD. (JP) | 1996-01-03 | — | — | EP | disclosed |
| EP-0350163-A2 | Renin inhibitory peptides | BEECHAM GROUP PLC (GB) | 1990-01-10 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120258964-A1 | 2-HETEROARYL CARBOXAMIDES | GRIN2A, CNR2, GRIN2C | MAPT 647/4885NPC1 94/4885PKM 2341/4885 |
| US-20220011665-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION-CONTROLLING AGENT | MRPS23, MRPS22, SLC11A2 | MAPT 4785/4885NPC1 3295/4885PKM 2451/4885 |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | MRPS23, MRPS22, SLC11A2 | MAPT 4792/4885NPC1 3463/4885PKM 2478/4885 |
| US-20110263591-A1 | 2-HETEROARYL CARBOXAMIDES | GRIN2A, CNR2, GRIN2C | MAPT 647/4885NPC1 94/4885PKM 2341/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.