SCHEMBL7600330

SCHEMBL7600330

[NH]CC[N]CCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL180219 0.82
SCHEMBL10002679 0.81
SCHEMBL10002737 0.79
SCHEMBL5688529 0.78 TSHR (0.33)
SCHEMBL5465614 0.69
SCHEMBL2565899 0.67
SCHEMBL5465916 0.67
SCHEMBL1996201 0.67
SCHEMBL66887 0.64
SCHEMBL1995351 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2471874-B1 AZO COMPOUNDS, INK COMPOSITIONS, AND COLORED BODIES NIPPON KAYAKU KK (JP) 2013-12-25 EP claimed
US-8512462-B2 Azo compounds, ink compositions, and colored bodies NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2013-08-20 US claimed
US-20120202019-A1 AZO COMPOUNDS, INK COMPOSITIONS, AND COLORED BODIES NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2012-08-09 US claimed
EP-2471874-A1 AZO COMPOUNDS, INK COMPOSITIONS, AND COLORED BODIES Nippon Kayaku Kabushiki Kaisha (JP) 2012-07-04 EP claimed
US-10190009-B2 Ink composition, ink jet recording method using same, and colored material NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2019-01-29 US disclosed
US-9587129-B2 Ink composition and ink set SEIKO EPSON CORPORATION (JP) 2017-03-07 US disclosed
US-20160160065-A1 INK COMPOSITION, INK JET RECORDING METHOD USING SAME, AND COLORED MATERIAL NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2016-06-09 US disclosed
US-20160137859-A1 INK COMPOSITION AND INK SET SEIKO EPSON CORPORATION (JP) 2016-05-19 US disclosed
EP-3015516-A1 INK COMPOSITION, INK JET RECORDING METHOD USING SAME, AND COLORED MATERIAL Nippon Kayaku Kabushiki Kaisha (JP) 2016-05-04 EP disclosed
US-20160032125-A1 INK SET SEIKO EPSON CORPORATION (JP) 2016-02-04 US disclosed
EP-2977414-A1 INK SET Seiko Epson Corporation (JP) 2016-01-27 EP disclosed
EP-2489706-B1 Ink composition and ink jet recording method using the same SEIKO EPSON CORP (JP) 2015-03-04 EP disclosed
EP-2489706-A1 Ink composition and ink jet recording method using the same Seiko Epson Corporation (JP) 2012-08-22 EP disclosed
US-20120202019-A1 AZO COMPOUNDS, INK COMPOSITIONS, AND COLORED BODIES NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2012-08-09 US disclosed
EP-2471874-A1 AZO COMPOUNDS, INK COMPOSITIONS, AND COLORED BODIES Nippon Kayaku Kabushiki Kaisha (JP) 2012-07-04 EP disclosed
EP-1259569-A1 DYE MIXTURE COMPRISING WATER-SOLUBLE FIBER-REACTIVE DYES, PREPARATION THEREOF AND USE THEREOF DyStar Textilfarben GmbH &amp; Co. Deutschland KG (DE) 2002-11-27 EP disclosed
US-6391066-B1 NAPHTHOL DYES WIH TRIAZINE GROUPS DYSTAR TEXTILFARBEN GMBH & CO. DEUTSCHLAND KG (DE) 2002-05-21 US disclosed
WO-2001062856-A1 DYE MIXTURE COMPRISING WATER-SOLUBLE FIBER-REACTIVE DYES, PREPARATION THEREOF AND USE THEREOF DYSTAR TEXTILFARBEN GMBH & CO. DEUTSCHLAND KG (DE) 2001-08-30 WO disclosed
EP-0432451-A2 Developer concentrate and developer therefrom for negative working printing plates with overcoat; method for producing printing plates Agfa-Gevaert AG (DE) 1991-06-19 EP disclosed
EP-0432450-A2 Developer concentrate and developer therefrom for exposed negative working printing plates with overcoat and method for producing printing plates Agfa-Gevaert AG (DE) 1991-06-19 EP disclosed