SCHEMBL7602827

SCHEMBL7602827

CN(C)c1ccc([S+](c2ccc(OCC(=O)OC(C)(C)C)cc2)c2ccc(OCC(=O)OC(C)(C)C)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.44
HTT P42858 1/20 0.44
PSEN1 P49768 3/20 0.42
PSEN2 P49810 3/20 0.42
APH1B Q8WW43 3/20 0.42
NCSTN Q92542 3/20 0.42
APH1A Q96BI3 3/20 0.42
PSENEN Q9NZ42 3/20 0.42
PTPN1 P18031 1/20 0.41
KDM4E B2RXH2 3/20 0.39
ALDH1A1 P00352 3/20 0.39
GAA P10253 2/20 0.39
RXRA P19793 2/20 0.39
NR1H2 P55055 2/20 0.39
NR1H3 Q13133 2/20 0.39
HDAC1 Q13547 1/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
RAB9A P51151 2/20 0.39
NPC1 O15118 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8322609 0.94 PSEN1 (0.43) MAPTHTTPSEN1PSEN2APH1B
SCHEMBL383065 0.90 PSEN1 (0.47) MAPTPSEN1PSEN2APH1BNCSTN
SCHEMBL6140474 0.88 PTPN1 (0.45) MAPTHTTPSEN1PSEN2APH1B
SCHEMBL6140187 0.88 PTPN1 (0.45) MAPTHTTPSEN1PSEN2APH1B
SCHEMBL6140552 0.88 MAPT (0.46) MAPTHTTPSEN1PSEN2APH1B
SCHEMBL6140151 0.88 MAPT (0.46) MAPTHTTPSEN1PSEN2APH1B
SCHEMBL8319103 0.88 MAPT (0.40) MAPTHTTPSEN1PSEN2APH1B
SCHEMBL8651662 0.87 PSEN1 (0.41) MAPTHTTPSEN1PSEN2APH1B
SCHEMBL8647752 0.87 PSEN1 (0.43) MAPTHTTPSEN1PSEN2APH1B
SCHEMBL133377 0.85 PTPN1 (0.51) MAPTPSEN1PSEN2APH1BNCSTN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6492075-B1 COATING WITH CLEAVING COMPOUND TO CONTROLLABLY DECREASE SIZE OF DEVELOPED RESIST ADVANCED MICRO DEVICES, INC. 2002-12-10 US disclosed
US-5880169-A HAVING HIGH RESOLUTION FOR FINE PATTERNING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-03-09 US disclosed