⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10798099 | 0.97 | — | — | |
| SCHEMBL103891 | 0.86 | — | — | |
| SCHEMBL9863284 | 0.85 | — | — | |
| SCHEMBL1482800 | 0.83 | — | — | |
| Ammonia Solution, Strong SCHEMBL8004370 | 0.83 | — | — | |
| SCHEMBL16807004 | 0.81 | — | — | |
| SCHEMBL703185 | 0.80 | — | — | |
| SCHEMBL703874 | 0.80 | — | — | |
| SCHEMBL21373919 | 0.78 | — | — | |
| SCHEMBL1143237 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 215 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210066075-A1 | STRUCTURES INCLUDING DIELECTRIC LAYERS AND METHODS OF FORMING SAME | ASM IP HOLDING B.V. (NL) | 2021-03-04 | — | — | US | claimed |
| US-11822243-B2 | Negative-type photosensitive resin composition, cured film, element and display device provided with cured film, and production method therefor | TORAY INDUSTRIES, INC. (JP) | 2023-11-21 | — | — | US | disclosed |
| CN-109062007-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2023-03-10 | — | — | CN | disclosed |
| CN-107885034-B | Negative white photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-03-07 | — | — | CN | disclosed |
| CN-108693710-B | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2022-12-02 | — | — | CN | disclosed |
| CN-109804310-B | Negative photosensitive resin composition, cured film, element and display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-09-30 | — | — | CN | disclosed |
| CN-114460809-A | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-05-10 | — | — | CN | disclosed |
| CN-108885399-B | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-03-15 | — | — | CN | disclosed |
| CN-107179652-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2022-02-08 | — | — | CN | disclosed |
| CN-108604062-B | Negative photosensitive resin composition, cured film, display device having cured film, and method for producing same | 东丽株式会社 | 2021-11-09 | — | — | CN | disclosed |
| US-20010055892-A1 | Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2001-12-27 | — | — | US | disclosed |
| US-20010051446-A1 | Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film | JSR CORPORATION (JP) | 2001-12-13 | — | — | US | disclosed |
| EP-1160848-A2 | Composition for silica-based film formation | JSR Corporation (JP) | 2001-12-05 | — | — | EP | disclosed |
| EP-1148105-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-24 | — | — | EP | disclosed |
| EP-1146092-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-17 | — | — | EP | disclosed |
| EP-1127929-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1090967-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1088868-A2 | Composition for film formation, method of film formation, and insulating film | JSR Corporation (JP) | 2001-04-04 | — | — | EP | disclosed |
| EP-0497102-A2 | Vanadium and magnesium containing component for a Ziegler-Natta catalytic system | BASF Aktiengesellschaft (DE) | 1992-08-05 | — | — | EP | disclosed |
| US-4678468-A | HEPARIN IN INTERPENETRATING POLYMER NETWORK | BIO-MEDICAL CO., LTD. (JP) | 1987-07-07 | — | — | US | disclosed |