Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 9/20 | 0.47 |
| ▸ | ESR2 | Q92731 | 9/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | FNTA | P49354 | 1/20 | 0.42 |
| ▸ | FNTB | P49356 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.42 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.42 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.42 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.42 |
| ▸ | TRPV1 | Q8NER1 | 1/20 | 0.41 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL3038824 | 0.98 | ESR1 (0.46) | ESR1ESR2CYP1A2CYP2C19MEN1 | |
| SCHEMBL1127520 | 0.92 | ESR1 (0.47) | ESR1ESR2CYP1A2CYP2C19MEN1 | |
| SCHEMBL20291444 | 0.88 | ACE (0.43) | ESR1ESR2SIGMAR1ACE | |
| SCHEMBL1127765 | 0.85 | SLC6A2 (0.48) | CYP1A2CYP2C19CYP3A4SLC6A2SLC6A3 | |
| Trifluoromethanesulfonic Acid SCHEMBL1741778 | 0.84 | ESR1 (0.43) | ESR1ESR2FNTAFNTBTRPV1 | |
| SCHEMBL69283 | 0.81 | SLC6A2 (0.55) | ESR1ESR2CYP1A2CYP2C19MEN1 | |
| SCHEMBL20473112 | 0.81 | ESR1 (0.53) | ESR1ESR2CYP1A2CYP2C19MEN1 | |
| Hydrochloric Acid SCHEMBL9331200 | 0.79 | CYP19A1 (0.48) | ESR1ESR2CYP1A2CYP2C19MEN1 | |
| SCHEMBL29152730 | 0.79 | TAAR1 (0.54) | ESR1ESR2ALDH1A1CYP2C9HIF1A | |
| SCHEMBL8585675 | 0.79 | HTR2A (0.47) | ESR1ESR2CYP1A2MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 182 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021133972-A1 | UV RESISTANT SURFACING MATERIALS FOR COMPOSITE PARTS | CYTEC INDUSTRIES INC. (US) | 2021-07-01 | — | — | WO | claimed |
| US-20040242818-A1 | Deodorizing agent for sulfur-or nitrogen-containing initiators | UCB, S.A. (BE) | 2004-12-02 | — | — | US | claimed |
| EP-1438347-A1 | DEODORIZING AGENT FOR SULFUR- OR NITROGEN-CONTAINING INITIATORS | UCB, S.A. (BE) | 2004-07-21 | — | — | EP | claimed |
| US-20030152862-A1 | Deodorizing agent for sulfur- or nitrogen-containing initiators | UCB, S. A. (BE) | 2003-08-14 | — | — | US | claimed |
| US-20030108810-A1 | Deodorizing agent for sulfur- or nitrogen-containing salt photoinitiators | UCB, S.A. (BE) | 2003-06-12 | — | — | US | claimed |
| WO-2003018663-A1 | DEODORIZING AGENT FOR SULFUR- OR NITROGEN-CONTAINING INITIATORS | UCB, S.A. (BE) | 2003-03-06 | — | — | WO | claimed |
| EP-0331496-B1 | POLYFLUORIDE SULFONIUM COMPOUNDS AND POLYMERIZATION INITIATOR THEREOF | SANSHIN KAGAKU KOGYO CO., LTD. (JP) | 1992-09-16 | — | — | EP | claimed |
| JP-2250836-A | — | — | None | — | — | JP | disclosed |
| WO-2026100367-A1 | RESIST MATERIAL AND PATTERN FORMATION METHOD | 東京応化工業株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20260118757-A1 | RADIATION-SENSITIVE RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-30 | — | — | US | disclosed |
| EP-4722810-A1 | RESIST MATERIAL, PATTERN FORMING METHOD, AND PATTERNED STRUCTURE | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-4722814-A1 | PATTERN FORMING METHOD AND PROCESSING LIQUID FOR METAL COMPOUND-CONTAINING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-4722811-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-1109827-A2 | BIOACTIVE PEPTIDES | ALPHARMA AS (NO) | 2001-06-27 | — | — | EP | disclosed |
| EP-1027190-A1 | COATED ABRASIVE PRODUCTS | UCB, S.A. (BE) | 2000-08-16 | — | — | EP | disclosed |
| WO-2000012542-A2 | CYTOTOXIC LACTOFERRIN DERIVATIVES MODIFIED BY BULKY OR LIPOPHILIC MOIETIES | ALPHARMA AS (NO) | 2000-03-09 | — | — | WO | disclosed |
| WO-1998032566-A1 | COATED ABRASIVE PRODUCTS | UCB, S.A. (BE) | 1998-07-30 | — | — | WO | disclosed |
| US-5730764-A | BLEND OF CURABLE EPOXY RESIN AND ONIUM SALT | SURFACE SPECIALTIES, S.A. (BE) | 1998-03-24 | — | — | US | disclosed |
| EP-0511405-A1 | CATIONICALLY POLYMERIZABLE ORGANIC MATERIAL COMPOSITION AND STABILIZATION OF SAID COMPOSITION | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1992-11-04 | — | — | EP | disclosed |
| JP-H02250836-A | BENZYLATING AGENT AND BENZYLATION OF THIOL | SANSHIN CHEM IND CO LTD | 1990-10-08 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118757-A1 | RADIATION-SENSITIVE RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME | SLC39A14, HCN4, SLC11A2 | ESR1 3369/4885ESR2 2768/4885CYP1A2 4308/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.