Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 9/20 | 0.47 |
| ▸ | ESR2 | Q92731 | 9/20 | 0.47 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.44 |
| ▸ | TAAR1 | Q96RJ0 | 3/20 | 0.44 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | MME | P08473 | 1/20 | 0.43 |
| ▸ | FNTA | P49354 | 1/20 | 0.42 |
| ▸ | FNTB | P49356 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL760350 | 0.92 | ESR1 (0.47) | ESR1ESR2SLC6A2MEN1ALDH1A1 | |
| Hydrochloric Acid SCHEMBL3038824 | 0.90 | ESR1 (0.46) | ESR1ESR2SLC6A2MEN1ALDH1A1 | |
| SCHEMBL1127765 | 0.85 | SLC6A2 (0.48) | TAAR1SLC6A2CYP1A2CYP3A4CYP2C19 | |
| SCHEMBL20291444 | 0.81 | ACE (0.43) | ESR1ESR2MME | |
| SCHEMBL983099 | 0.81 | SLC6A2 (0.55) | ESR1ESR2SLC7A5TAAR1SLC6A2 | |
| SCHEMBL20473112 | 0.81 | ESR1 (0.53) | ESR1ESR2TAAR1SLC6A2MEN1 | |
| Hydrochloric Acid SCHEMBL9331200 | 0.79 | CYP19A1 (0.48) | ESR1ESR2TAAR1MEN1ALDH1A1 | |
| SCHEMBL20425314 | 0.79 | ESR1 (0.55) | ESR1ESR2SLC7A5TAAR1SLC6A2 | |
| SCHEMBL1838937 | 0.79 | ESR1 (0.50) | ESR1ESR2SLC7A5TAAR1SLC6A2 | |
| SCHEMBL163773 | 0.79 | ESR1 (0.55) | ESR1ESR2SLC7A5TAAR1SLC6A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 368 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1752463-B1 | NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX | SAN APRO LTD (JP) | 2013-07-17 | — | — | EP | claimed |
| US-12623999-B2 | Carbamate production method, carbamate ester production method, and urea derivative production method | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2026-05-12 | — | — | US | disclosed |
| EP-4738010-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME | Toray Industries, Inc. (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-3741811-B1 | COMPOUND, INK, RESIST COMPOSITION FOR COLOR FILTER, THERMAL TRANSFER RECORDING SHEET, AND TONER | CANON KK (JP) | 2026-03-11 | — | — | EP | disclosed |
| EP-4696511-A1 | INK-JET RECORDING HEAD | Canon Kabushiki Kaisha (JP) | 2026-02-18 | — | — | EP | disclosed |
| US-20260042917-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20260042918-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20260042294-A1 | INK-JET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692937-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER | Toray Industries, Inc. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4691783-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | CANON KABUSHIKI KAISHA (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-2239295-A2 | Radiation-curable silicone composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100255417-A1 | RADIATION-CURABLE SILICONE COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100119939-A1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| US-7709598-B2 | Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex | SAN-APRO LIMITED (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20100068649-A1 | PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMATION METHOD USING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100047715-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM, CHEMICALLY AMPLIFIED DRY FILM FOR THICK FILM, AND METHOD FOR PRODUCTION OF THICK FILM RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| EP-2131423-A1 | NEGATIVE ELECTRODE BASE MEMBER | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2009-12-09 | — | — | EP | disclosed |
| US-20080311512-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PATTERN FORMING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | SAN-APRO LIMITED (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1752463-A1 | NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX | San-Apro Limited (JP) | 2007-02-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260042917-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | MLLT3, OR10J3, RFT1 | ESR1 816/4885ESR2 976/4885SLC7A5 2160/4885 |
| US-20260042294-A1 | INK-JET RECORDING HEAD | SEM1, ASIC1, C9 | ESR1 980/4885ESR2 1525/4885SLC7A5 1714/4885 |
| US-12623999-B2 | Carbamate production method, carbamate ester production method, and urea derivative production method | CPS1, CA2, CHRM2 | ESR1 1412/4885ESR2 621/4885SLC7A5 464/4885 |
| US-20070225458-A1 | Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex | AS3MT, TTR, PFAS | ESR1 4400/4885ESR2 4546/4885SLC7A5 98/4885 |
| US-20260042918-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | MLLT1, MLLT3, ERCC1 | ESR1 60/4885ESR2 132/4885SLC7A5 4447/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.