SCHEMBL7611207

SCHEMBL7611207

C=CC(=O)NCC.C=CC(=O)NCO

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.52
ALDH1A1 P00352 3/20 0.52
MAPK1 P28482 1/20 0.52
TDP1 Q9NUW8 1/20 0.52
ZDHHC20 Q5W0Z9 1/20 0.48
ZDHHC2 Q9UIJ5 1/20 0.48
TGM2 P21980 3/20 0.36
MMP1 P03956 1/20 0.33
MMP2 P08253 1/20 0.33
MMP3 P08254 1/20 0.33
MMP9 P14780 1/20 0.33
MMP8 P22894 1/20 0.33
PSMB5 P28074 1/20 0.33
EPHX2 P34913 1/20 0.33
KMT2A Q03164 1/20 0.32
GAA P10253 1/20 0.32
MCL1 Q07820 1/20 0.31
SLC6A19 Q695T7 1/20 0.31
THRA P10827 1/20 0.31
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Alcohol SCHEMBL11584276 0.91 TSHR (0.56) TSHRALDH1A1MAPK1TDP1ZDHHC20
Propane SCHEMBL8855237 0.91 TSHR (0.56) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL15005 0.91
SCHEMBL17047583 0.91 TSHR (0.62) TSHRALDH1A1MAPK1TDP1ZDHHC20
Ethylene Glycol SCHEMBL15158084 0.88 ALDH1A1 (0.54) TSHRALDH1A1MAPK1TDP1ZDHHC20
Hydrochloric Acid SCHEMBL3129031 0.88
Ethane SCHEMBL9809196 0.88
SCHEMBL3661744 0.88
Ammonia Solution, Strong SCHEMBL7047525 0.88
Water SCHEMBL27545150 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6346365-B1 DEVELOPMENT OF ALKALI AQUEOUS SOLUTION SOLUBLE POLYMER; LIGHT ABSORPTION GENERATES HEAT; OFFSET PRINTING; SOLVENT RESISTANCE FUJI PHOTO FILM CO., LTD. (JP) 2002-02-12 US disclosed
US-6117613-A ALKALI AQUEOUS SOLUTION SOLUBLE POLYMER COMPOUND HAVING A FUNCTIONAL GROUP OF PHENOLIC HYDROXIDE, SULFONAMIDE AND/OR ACTIVE IMIDE AND AN ACTIVE COMPOUND TO LOWER THE SOLUBILITY BUT THIS EFFECT IS REDUCED BY HEAT; PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 2000-09-12 US disclosed
EP-0901902-A2 Positive photosensitive composition for use with an infrared laser Fuji Photo Film Co., Ltd. (JP) 1999-03-17 EP disclosed