Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | TP53 | P04637 | 2/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7612885 | 0.93 | TSHR (0.40) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL30945099 | 0.83 | TSHR (0.33) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL14962546 | 0.65 | ALDH1A1 (0.48) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL24858188 | 0.64 | — | — | |
| SCHEMBL31440185 | 0.62 | TSHR (0.53) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL30604742 | 0.62 | TSHR (0.84) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL93462 | 0.62 | TSHR (0.84) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL9633534 | 0.61 | TSHR (0.52) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL7198671 | 0.61 | — | — | |
| SCHEMBL23963473 | 0.60 | ALDH1A1 (0.46) | TSHRALDH1A1TP53HIF1AHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6437052-B1 | Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same | NEC CORPORATION (JP) | 2002-08-20 | — | — | US | disclosed |
| US-20020016431-A1 | Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same background of the invention | NEC CORPORATION | 2002-02-07 | — | — | US | disclosed |
| JP-2000143588-A | ALICYCLIC (METH)ACRYLATE HAVING DIOL STRUCTURE | NEC CORP | 2000-05-23 | — | — | JP | disclosed |