SCHEMBL7615086

SCHEMBL7615086

C=C(C)C(=O)NC(C)(CO)CO

nearest known ligand 0.39

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TGFBR1 P36897 1/20 0.39
KMT2A Q03164 1/20 0.34
ALDH1A1 P00352 2/20 0.32
TDP1 Q9NUW8 1/20 0.31
KDM4E B2RXH2 2/20 0.31
PKM P14618 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25763073 0.83 KMT2A (0.39) KMT2AKDM4EPKM
SCHEMBL18709152 0.82 TGFBR1 (0.35) TGFBR1ALDH1A1TDP1KDM4E
SCHEMBL7611640 0.82 TGFBR1 (0.39) TGFBR1ALDH1A1TDP1KDM4EPKM
SCHEMBL8399627 0.82 KMT2A (0.34) TGFBR1KMT2A
SCHEMBL8813244 0.80 MEN1 (0.42) KMT2A
SCHEMBL202411 0.79 TGFBR1 (0.41) TGFBR1ALDH1A1TDP1KDM4EPKM
SCHEMBL8600696 0.77 TGFBR1 (0.39) TGFBR1ALDH1A1TDP1KDM4EPKM
SCHEMBL138082 0.75 EPHX1 (0.41) TGFBR1KMT2AALDH1A1TDP1KDM4E
SCHEMBL6584558 0.75 KDM4E (0.43) KMT2AKDM4EPKM
Phosphonic Acid SCHEMBL2559975 0.75 TGFBR1 (0.32) TGFBR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0596023-B1 PAINT COMPOSITION HEMPELS SKIBSFARVE FAB J C (DK) 1998-10-14 EP claimed
EP-0764506-B1 PROCESS FOR PRODUCING MULTI-LAYER MOLDED ARTICLES ARACO KK (JP) 2002-01-02 EP disclosed
US-6024895-A COMPRISING SOLUBLE, ELECTRICALLY CONDUCTING POLYMER HAVING SULFONIC ACID GROUP AND/OR CARBOXYL GROUP AND THERMALLY CROSS-LINKABLE OR ULTRAVIOLET- OR ELECTRON BEAM-CROSS-LINKABLE RESIN OR PAINT MITSUBISHI RAYON CO., LTD. (JP) 2000-02-15 US disclosed
US-5961902-A Manufacturing method for molded multilayer article ARACO KABUSHIKI KAISHA (JP) 1999-10-05 US disclosed
EP-0596023-B1 PAINT COMPOSITION HEMPELS SKIBSFARVE FAB J C (DK) 1998-10-14 EP disclosed
EP-0844284-A1 CROSS-LINKABLE CONDUCTIVE COMPOSITION, CONDUCTOR, AND PROCESS FOR FORMING THE SAME NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1998-05-27 EP disclosed
EP-0837112-A2 Cross-linkable, electrically conductive composition, electric conductor and process for forming the same NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1998-04-22 EP disclosed
EP-0764506-A1 PROCESS FOR PRODUCING MULTI-LAYER MOLDED ARTICLES ARACO KABUSHIKI KAISHA (JP) 1997-03-26 EP disclosed
EP-0439072-B1 Electrophotographic light-sensitive material FUJI PHOTO FILM CO LTD (JP) 1996-04-03 EP disclosed
EP-0432727-B1 Electrophotographic light-sensitive material FUJI PHOTO FILM CO LTD (JP) 1995-07-05 EP disclosed
EP-0307227-B1 Electrophotographic photoreceptor FUJI PHOTO FILM CO LTD (JP) 1995-06-28 EP disclosed
US-5227272-A Layer containing inorganic photoconductor and binder resin with block copolymer composed of acidic component and hydrocarbyl methacrylate component FUJI PHOTO FILM CO., LTD. (JP) 1993-07-13 US disclosed
WO-1993002146-A1 PAINT COMPOSITION J.C. HEMPEL'S SKIBSFARVE-FABRIK A/S (DK) 1993-02-04 WO disclosed
US-5147752-A Crosslinked binder FUJI PHOTO FILM CO., LTD. (JP) 1992-09-15 US disclosed
US-5089368-A Binder resin of graft copolymer made from an acid group-containing macromolecular block polymer monomer FUJI PHOTO FILM CO., LTD. (JP) 1992-02-18 US disclosed
EP-0439072-A2 Electrophotographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1991-07-31 EP disclosed
US-4968572-A EXCELLENT ELECTROSTATIC CHARACTERISTICS AND IMAGE FORMATION PERFORMANCE IN SPITE OF HEAT AND HUMIDITY FUJI PHOTO FILM CO., LTD. (JP) 1990-11-06 US disclosed