⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL890988 | 0.83 | MAPK1 (0.33) | — | |
| SCHEMBL187543 | 0.79 | PPP5C (0.32) | — | |
| SCHEMBL9717701 | 0.76 | PPP5C (0.34) | — | |
| SCHEMBL9256763 | 0.75 | — | — | |
| SCHEMBL8997401 | 0.74 | — | — | |
| SCHEMBL17626919 | 0.72 | LMNA (0.30) | — | |
| SCHEMBL11889712 | 0.70 | — | — | |
| SCHEMBL844686 | 0.69 | — | — | |
| SCHEMBL1302441 | 0.68 | PPP5C (0.30) | — | |
| SCHEMBL9017702 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6436484-B1 | Processes for coating sewing thread | COATS AMERICAN, INC. | 2002-08-20 | — | — | US | disclosed |
| US-5527660-A | PEEL-DEVELOPABLE IMAGING MEDIUM HAVING CYCLOALIPHATIC DIEPOXIDE COMPOUND IN IMAGE-FORMING LAYER OR RELEASE LAYER | POLAROID CORPORATION (US) | 1996-06-18 | — | — | US | disclosed |