SCHEMBL7625792

SCHEMBL7625792

CCCCCOC(=O)C(C)Cl

nearest known ligand 0.57

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.52
EPHX1 P07099 1/20 0.48
TSHR P16473 4/20 0.47
ALDH1A1 P00352 2/20 0.46
HCAR2 Q8TDS4 2/20 0.46
TP53 P04637 1/20 0.44
CYP3A4 P08684 1/20 0.44
MAPK1 P28482 1/20 0.44
RAD52 P43351 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44
ATM Q13315 1/20 0.43
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
CA9 Q16790 1/20 0.43
FAAH O00519 1/20 0.43
LMNA P02545 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6939866 0.98 NAAA (0.55) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL29547340 0.98 NAAA (0.55) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL15820666 0.98 NAAA (0.55) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL21811593 0.98 NAAA (0.55) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL21381336 0.98 NAAA (0.55) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL11783332 0.98 NAAA (0.55) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL31135798 0.98 NAAA (0.55) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL21811909 0.98 NAAA (0.55) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL21811448 0.98 NAAA (0.55) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL11789584 0.98 NAAA (0.55) NAAAEPHX1TSHRALDH1A1HCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119661458-A N-phenyl triazinone derivative and preparation method and application thereof 贵州大学 2025-03-21 CN claimed
CN-102260362-B Atactic multiblock styrene polymer and preparation method thereof UNIV BEIJING CHEMICAL 2013-04-10 CN claimed
CN-102260362-A Atactic multiblock styrene polymer and preparation method thereof 2011-11-30 CN claimed
CN-119661458-A N-phenyl triazinone derivative and preparation method and application thereof 贵州大学 2025-03-21 CN disclosed
US-11958802-B2 Migration-resistant photopolymerization sensitizer KAWASAKI KASEI CHEMICALS LTD. (JP) 2024-04-16 US disclosed
CN-113166036-B Photopolymerizing sensitizers with migration resistance 川崎化成工业株式会社 2023-10-10 CN disclosed
US-20220106254-A1 MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-04-07 US disclosed
CN-113166036-A Photopolymerisable sensitizers having migration resistance 川崎化成工业株式会社 2021-07-23 CN disclosed
WO-2020213442-A1 PHOTOPOLYMERIZABLE COMPOSITION, COATING FILM CONTAINING SAID PHOTOPOLYMERIZABLE COMPOSITION, AND CURING METHOD THEREFOR 川崎化成工業株式会社 2020-10-22 WO disclosed
WO-2020208833-A1 PHOTO-RADICALLY CURABLE OXYGEN-INHIBITION-REDUCING AGENT, PHOTO-RADICALLY CURABLE OXYGEN-INHIBITION-REDUCING AGENT-CONTAINING PHOTO-RADICALLY POLYMERIZABLE COMPOSITION, PHOTO-RADICALLY CURABLE OXYGEN-INHIBITION-REDUCING AGENT-CONTAINING COATING FILM, AND METHOD FOR CURING SAME 川崎化成工業株式会社 2020-10-15 WO disclosed
WO-2020209209-A1 RADICAL PHOTOCURING OXYGEN INHIBITION REDUCER, RADICAL PHOTOPOLYMERIZABLE COMPOSITION CONTAINING RADICAL PHOTOCURING OXYGEN INHIBITION REDUCER, COATING CONTAINING RADICAL PHOTOCURING OXYGEN INHIBITION REDUCER, AND METHOD FOR CURING SAME 川崎化成工業株式会社 2020-10-15 WO disclosed
WO-2020121384-A1 PHOTOPOLYMERIZATION SENSITIZER HAVING MIGRATION RESISTANCE 川崎化成工業株式会社 2020-06-18 WO disclosed
WO-2020121544-A1 MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER 川崎化成工業株式会社 2020-06-18 WO disclosed
WO-2020054874-A1 PHOTOPOLYMERIZATION SENSITIZER 川崎化成工業株式会社 2020-03-19 WO disclosed
WO-2020054116-A1 PHOTOPOLYMERIZATION SENSITIZER 川崎化成工業株式会社 2020-03-19 WO disclosed
CN-102260362-B Atactic multiblock styrene polymer and preparation method thereof UNIV BEIJING CHEMICAL 2013-04-10 CN disclosed
CN-102260362-A Atactic multiblock styrene polymer and preparation method thereof 2011-11-30 CN disclosed
US-6372691-B2 USING A PROPIONIC ACID ESTER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-04-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11958802-B2 Migration-resistant photopolymerization sensitizer F12, F10, PCNA NAAA 1666/4885EPHX1 1588/4885TSHR 2947/4885
US-20220106254-A1 MIGRATION-RESISTANT PHOTOPOLYMERIZATION SENSITIZER F12, F10, PCNA NAAA 1666/4885EPHX1 1588/4885TSHR 2947/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.