SCHEMBL7635509

SCHEMBL7635509

CC1(O)CCC(C(=O)O)CC1(C)O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 3/20 0.48
GRM2 Q14416 2/20 0.48
GRM3 Q14832 2/20 0.48
GRM4 Q14833 2/20 0.48
CYP1A2 P05177 2/20 0.48
ALOX15 P16050 2/20 0.48
TSHR P16473 2/20 0.48
LMNA P02545 2/20 0.48
TDP1 Q9NUW8 1/20 0.48
GRM8 O00222 1/20 0.48
GRM6 O15303 1/20 0.48
GRM5 P41594 1/20 0.48
MTOR P42345 1/20 0.48
GRM1 Q13255 1/20 0.48
PLCB1 Q9NQ66 1/20 0.48
APLNR P35414 1/20 0.48
KDM4E B2RXH2 1/20 0.35
ALDH1A1 P00352 1/20 0.35
ARG1 P05089 1/20 0.35
ARG2 P78540 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15304339 0.80 GRM2 (0.50) CYP2C19GRM2GRM3GRM4CYP1A2
SCHEMBL2159223 0.80 GRM2 (0.50) CYP2C19GRM2GRM3GRM4CYP1A2
SCHEMBL16751017 0.80 GRM2 (0.50) CYP2C19GRM2GRM3GRM4CYP1A2
SCHEMBL8318891 0.77 APLNR (0.65) CYP2C19GRM2GRM3GRM4CYP1A2
SCHEMBL17212627 0.77 APLNR (0.65) CYP2C19GRM2GRM3GRM4CYP1A2
SCHEMBL23590185 0.77 APLNR (0.65) CYP2C19GRM2GRM3GRM4CYP1A2
SCHEMBL7388250 0.76 CYP2C19 (0.50) CYP2C19GRM2GRM3GRM4CYP1A2
SCHEMBL321916 0.75 APLNR (0.48) CYP2C19GRM2GRM3GRM4CYP1A2
SCHEMBL321917 0.75 APLNR (0.48) CYP2C19GRM2GRM3GRM4CYP1A2
SCHEMBL321915 0.75 APLNR (0.48) CYP2C19GRM2GRM3GRM4CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6461788-B1 COMPOUNDS HAVING SPECIFIC CYCLOHEXANELACTONE STRUCTURE FORM POLYMERS HAVING HIGH TRANSPARENCY AT SHORT WAVELENGTH SUCH AS ARGON FLUORIDE EXCIMER LASER, EXCELLENT DRY ETCHING RESISTANCE AND SUBSTRATE ADHERENCE; USEFUL FOR RESISTS MARUZEN PETROCHEMICAL CO., LTD. (JP) 2002-10-08 US disclosed