⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL898204 | 0.87 | CYP3A4 (0.31) | — | |
| SCHEMBL1008672 | 0.78 | — | — | |
| SCHEMBL1008805 | 0.78 | — | — | |
| SCHEMBL472808 | 0.77 | — | — | |
| SCHEMBL19348802 | 0.76 | — | — | |
| SCHEMBL87740 | 0.74 | — | — | |
| SCHEMBL1471538 | 0.74 | ALDH1A1 (0.31) | — | |
| SCHEMBL1009512 | 0.73 | — | — | |
| SCHEMBL19348800 | 0.73 | — | — | |
| SCHEMBL759915 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112745853-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2024-03-26 | — | — | CN | claimed |
| CN-112824482-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2024-03-26 | — | — | CN | claimed |
| CN-112779014-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2024-01-09 | — | — | CN | claimed |
| CN-112521946-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2023-12-22 | — | — | CN | claimed |
| CN-110655924-B | Silicon substrate etching solution | OCI有限公司 | 2022-11-04 | — | — | CN | claimed |
| CN-110655924-A | Silicon substrate etching solution | OCI有限公司 | 2020-01-07 | — | — | CN | claimed |
| US-10167425-B2 | Etching solution capable of suppressing particle appearance | OCI COMPANY LTD. (KR) | 2019-01-01 | — | — | US | claimed |
| CN-107573940-A | Silicon nitride film etching solution | OCI有限公司 | 2018-01-12 | — | — | CN | claimed |
| CN-107345137-A | The etching solution of particle appearance can be suppressed | OCI有限公司 | 2017-11-14 | — | — | CN | claimed |
| US-20170321121-A1 | ETCHING SOLUTION CAPABLE OF SUPPRESSING PARTICLE APPEARANCE | OCI COMPANY LTD. (KR) | 2017-11-09 | — | — | US | claimed |
| CN-112210378-B | Silicon nitride film etching solution and preparation method thereof | OCI有限公司 | 2024-04-12 | — | — | CN | disclosed |
| CN-112745853-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2024-03-26 | — | — | CN | disclosed |
| CN-112824482-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2024-03-26 | — | — | CN | disclosed |
| CN-112779014-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2024-01-09 | — | — | CN | disclosed |
| CN-112521946-B | Silicon nitride film etching solution and method for manufacturing semiconductor device using the same | OCI有限公司 | 2023-12-22 | — | — | CN | disclosed |
| US-10167425-B2 | Etching solution capable of suppressing particle appearance | OCI COMPANY LTD. (KR) | 2019-01-01 | — | — | US | disclosed |
| CN-107573940-A | Silicon nitride film etching solution | OCI有限公司 | 2018-01-12 | — | — | CN | disclosed |
| US-20170321121-A1 | ETCHING SOLUTION CAPABLE OF SUPPRESSING PARTICLE APPEARANCE | OCI COMPANY LTD. (KR) | 2017-11-09 | — | — | US | disclosed |
| US-20160334701-A1 | PHOTOCURABLE COMPOSITION FOR NANOIMPRINTING, AND METHOD FOR FORMING FINE PATTERN USING THE SAME | DAICEL CORPORATION (JP) | 2016-11-17 | — | — | US | disclosed |
| EP-1178050-A2 | Fluoroalkylphosphates for use in electrochemical cells | MERCK PATENT GmbH (DE) | 2002-02-06 | — | — | EP | disclosed |