⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2408473 | 0.79 | TAAR1 (0.60) | — | |
| SCHEMBL29365799 | 0.78 | IDO1 (0.63) | — | |
| SCHEMBL125429 | 0.78 | IDO1 (0.63) | — | |
| SCHEMBL6272165 | 0.77 | HSPA5 (0.42) | — | |
| SCHEMBL49745 | 0.77 | HSPA5 (1.00) | — | |
| SCHEMBL29357407 | 0.77 | HSPA5 (1.00) | — | |
| SCHEMBL29706272 | 0.77 | TAAR1 (0.71) | — | |
| SCHEMBL1222973 | 0.77 | TAAR1 (0.71) | — | |
| SCHEMBL12773013 | 0.75 | HSPA5 (0.41) | — | |
| SCHEMBL10540048 | 0.75 | TAAR1 (0.56) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106588720-B | Sulfidomethyl amphyl preparation method and application based on dual catalyst system | 中国科学院宁波材料技术与工程研究所 | 2019-06-11 | — | — | CN | claimed |
| CN-104105715-B | Chloroprene rubber composition, use the adhesive composition of this chloroprene rubber composition | DENKA Co.,Ltd. (JP) | 2016-05-11 | — | — | CN | claimed |
| EP-0545865-B1 | Stabilizing mixture | CIBA GEIGY AG (CH) | 1996-02-28 | — | — | EP | claimed |
| US-5276258-A | And tackifier resins, phenolic compounds containing thioether groups and epoxidized fatty acids or esters | CIBA-GEIGY CORPORATION (US) | 1994-01-04 | — | — | US | claimed |
| EP-0545865-A2 | Stabilizing mixture | CIBA-GEIGY AG (CH) | 1993-06-09 | — | — | EP | claimed |
| JP-9302317-A | — | — | None | — | — | JP | disclosed |
| JP-5320641-A | — | — | None | — | — | JP | disclosed |
| CN-117420731-A | Negative photosensitive composition and pattern forming method | 东京应化工业株式会社 | 2024-01-19 | — | — | CN | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| CN-116635788-A | Photosensitive dry film, laminated film, method for producing laminated film, and method for producing patterned resist film | 东京应化工业株式会社 | 2023-08-22 | — | — | CN | disclosed |
| EP-0440390-A1 | Process for the preparation of bisphenols | THE DOW CHEMICAL COMPANY (US) | 1991-08-07 | — | — | EP | disclosed |
| EP-0338173-A1 | Ionic dressing for topical administration of drugs to wounds and burns | RICOH KYOSAN INC. (JP) | 1989-10-25 | — | — | EP | disclosed |
| US-4874885-A | Process for the preparation of mercaptomethylphenols | CIBA-GEIGY CORPORATION (US) | 1989-10-17 | — | — | US | disclosed |
| US-4874885-A | Process for the preparation of mercaptomethylphenols | CIBA-GEIGY CORPORATION (US) | 1989-10-17 | — | — | US | disclosed |
| US-4874885-A | Process for the preparation of mercaptomethylphenols | CIBA-GEIGY CORPORATION (US) | 1989-10-17 | — | — | US | disclosed |
| EP-0275832-A1 | Process for the preparation of mercaptomethylphenols | CIBA-GEIGY AG (CH) | 1988-07-27 | — | — | EP | disclosed |
| EP-0252006-A1 | Substituted phenols and their use as stabilizing agents | CIBA-GEIGY AG (CH) | 1988-01-07 | — | — | EP | disclosed |
| US-4231782-A | HERBICIDES | MONSANTO COMPANY (US) | 1980-11-04 | — | — | US | disclosed |