Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHEK1 | O14757 | 1/20 | 0.31 |
| ▸ | NEK2 | P51955 | 1/20 | 0.31 |
| ▸ | LIMK1 | P53667 | 1/20 | 0.31 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.31 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.31 |
| ▸ | GAA | P10253 | 2/20 | 0.31 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | EP300 | Q09472 | 1/20 | 0.30 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.30 |
| ▸ | KAT8 | Q9H7Z6 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9757011 | 0.84 | GAA (0.39) | CHEK1NEK2LIMK1DYRK1ACLK4 | |
| SCHEMBL7902639 | 0.81 | — | — | |
| SCHEMBL2100503 | 0.79 | GAA (0.35) | GAAKMT2A | |
| SCHEMBL2099550 | 0.78 | MAPT (0.44) | CHEK1NEK2LIMK1DYRK1ACLK4 | |
| SCHEMBL2270034 | 0.76 | — | — | |
| SCHEMBL2101016 | 0.76 | — | — | |
| SCHEMBL11789041 | 0.72 | CHEK1 (0.32) | CHEK1NEK2LIMK1DYRK1ACLK4 | |
| SCHEMBL2269255 | 0.71 | — | — | |
| SCHEMBL1503457 | 0.70 | CHEK1 (0.35) | CHEK1NEK2LIMK1DYRK1ACLK4 | |
| SCHEMBL132669 | 0.70 | EP300 (0.48) | CHEK1NEK2LIMK1DYRK1ACLK4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 333 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250305131-A1 | LOW TEMPERATURE THERMAL DEPOSITION OF SILICON-CONTAINING FILMS USING LOW WATER CONTENT HYDROGEN PEROXIDE | GELEST, INC. | 2025-10-02 | — | — | US | claimed |
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| US-12381161-B2 | Backside wafer treatments to reduce distortions and overlay errors during wafer chucking | INTEL CORPORATION (US) | 2025-08-05 | — | — | US | claimed |
| US-20240113039-A1 | BACKSIDE WAFER TREATMENTS TO REDUCE DISTORTIONS AND OVERLAY ERRORS DURING WAFER CHUCKING | INTEL CORPORATION (US) | 2024-04-04 | — | — | US | claimed |
| US-11649547-B2 | Deposition of carbon doped silicon oxide | VERSUM MATERIALS US, LLC (US) | 2023-05-16 | — | — | US | claimed |
| US-11631580-B2 | Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials | VERSUM MATERIALS US, LLC (US) | 2023-04-18 | — | — | US | claimed |
| US-20220259722-A1 | SUBSTRATE SURFACE MODIFIER FOR ATOMIC LAYER DEPOSITION AND METHOD FOR MODIFYING SURFACE OF SUBSTRATE USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2022-08-18 | — | — | US | claimed |
| US-20220189767-A1 | FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS | VERSUM MATERIALS US, LLC (US) | 2022-06-16 | — | — | US | claimed |
| US-20210363639-A1 | COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC (US) | 2021-11-25 | — | — | US | claimed |
| EP-3902939-A1 | DEPOSITION OF CARBON DOPED SILICON OXIDE | Versum Materials US, LLC (US) | 2021-11-03 | — | — | EP | claimed |
| US-20050095840-A1 | Repairing damage to low-k dielectric materials using silylating agents | SOLSTICE ADVANCED MATERIALS US, INC. | 2005-05-05 | — | — | US | claimed |
| WO-2005034194-A2 | REPAIRING DAMAGE TO LOW-K DIELECTRIC MATERIALS USING SILYLATING AGENTS | HONEYWELL INTERNATIONAL INC. (US) | 2005-04-14 | — | — | WO | claimed |
| US-6770572-B1 | Use of multifunctional si-based oligomer/polymer for the surface modification of nanoporous silica films | ALLIEDSIGNAL INC. | 2004-08-03 | — | — | US | claimed |
| JP-2004513503-A | — | — | 2004-04-30 | — | — | JP | claimed |
| US-6518205-B1 | Multifunctional reagents for the surface modification of nanoporous silica films | ALLIEDSIGNAL INC. | 2003-02-11 | — | — | US | claimed |
| US-20020001973-A1 | Use of multifunctional si-based oligomer/polymer for the surface modification of nanoporous silica films | WU HUI-JUNG (US) | 2002-01-03 | — | — | US | claimed |
| EP-1153426-A1 | USE OF MULTIFUNCTIONAL SI-BASED OLIGOMER/POLYMER FOR THE SURFACE MODIFICATION OF NANOPOROUS SILICA FILMS | AlliedSignal Inc. (US) | 2001-11-14 | — | — | EP | claimed |
| US-6208014-B1 | HYDROPHOBIC DIELECTRIC FILM PRODUCED BY REACTING A HYDROPHILIC SILICA FILM WITH A MULTIFUNCTIONAL SURFACE MODIFICATION AGENT THAT IS CAPABLE OF SILYLATING OR CAPPING SILANOL MOIETIES ON HYDROPHILIC SURFACES | ALLIEDSIGNAL, INC. | 2001-03-27 | — | — | US | claimed |
| EP-0667562-B1 | Charge injection barrier for positive charging organic photoconductor | HEWLETT PACKARD CO (US) | 2001-03-21 | — | — | EP | claimed |
| WO-2000044036-A1 | USE OF MULTIFUNCTIONAL SI-BASED OLIGOMER/POLYMER FOR THE SURFACE MODIFICATION OF NANOPOROUS SILICA FILMS | ALLIEDSIGNAL INC. (US) | 2000-07-27 | — | — | WO | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11649547-B2 | Deposition of carbon doped silicon oxide | ESRRG, ESRRB, DNMT3B | CHEK1 3429/4885NEK2 2398/4885LIMK1 4339/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.