Sugi Predict

Sugi Predict / Compounds / SCHEMBL765973

SCHEMBL765973

SCHEMBL765973

CN(C)[Si](c1ccccc1)(N(C)C)N(C)C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 2/20 0.40
▸ KMT2A Q03164 2/20 0.40
▸ HTT P42858 1/20 0.40
▸ ESR1 P03372 1/20 0.37
▸ ESR2 Q92731 1/20 0.37
▸ ALDH1A1 P00352 4/20 0.36
▸ TSHR P16473 3/20 0.36
▸ KCNN4 O15554 1/20 0.36
▸ LMNA P02545 1/20 0.33
▸ ALOX12 P18054 1/20 0.33
▸ ACHE P22303 1/20 0.33
▸ HTR2A P28223 1/20 0.33
▸ HRH1 P35367 1/20 0.33
▸ MAPT P10636 1/20 0.33
▸ AOC3 Q16853 1/20 0.33
▸ OPRM1 P35372 1/20 0.33
▸ OPRK1 P41145 1/20 0.33
▸ OPRL1 P41146 1/20 0.33
▸ TAAR1 Q96RJ0 1/20 0.33
▸ NPC1 O15118 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2101677 0.81 TSHR (0.33) MEN1KMT2AHTTESR1ESR2
SCHEMBL2101178 0.81 TSHR (0.33) MEN1KMT2AHTTESR1ESR2
SCHEMBL435723 0.77 ESR1 (0.37) MEN1KMT2AHTTESR1ESR2
SCHEMBL2276954 0.77 ESR1 (0.37) MEN1KMT2AHTTESR1ESR2
SCHEMBL16033823 0.76 MEN1 (0.58) MEN1KMT2AHTTALDH1A1LMNA
SCHEMBL15166741 0.74 ESR1 (0.41) MEN1KMT2AHTTESR1ESR2
SCHEMBL1503455 0.74 ESR1 (0.41) MEN1KMT2AHTTESR1ESR2
SCHEMBL1203911 0.74 ESR1 (0.41) MEN1KMT2AHTTESR1ESR2
SCHEMBL20499840 0.74 TP53 (0.40) MEN1KMT2AHTTESR1ESR2
SCHEMBL11324533 0.72 MEN1 (0.43) MEN1KMT2AHTTESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 397 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250305131-A1 LOW TEMPERATURE THERMAL DEPOSITION OF SILICON-CONTAINING FILMS USING LOW WATER CONTENT HYDROGEN PEROXIDE GELEST, INC. 2025-10-02 — — US claimed
US-12421603-B2 Composition for high temperature atomic layer deposition of high quality silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2025-09-23 — — US claimed
US-12381161-B2 Backside wafer treatments to reduce distortions and overlay errors during wafer chucking INTEL CORPORATION (US) 2025-08-05 — — US claimed
CN-119900018-A Composition for high temperature atomic layer deposition of high quality silicon oxide films 弗萨姆材料美国有限责任公司 2025-04-29 — — CN claimed
US-20240113039-A1 BACKSIDE WAFER TREATMENTS TO REDUCE DISTORTIONS AND OVERLAY ERRORS DURING WAFER CHUCKING INTEL CORPORATION (US) 2024-04-04 — — US claimed
US-11649547-B2 Deposition of carbon doped silicon oxide VERSUM MATERIALS US, LLC (US) 2023-05-16 — — US claimed
US-11631580-B2 Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials VERSUM MATERIALS US, LLC (US) 2023-04-18 — — US claimed
US-20220259722-A1 SUBSTRATE SURFACE MODIFIER FOR ATOMIC LAYER DEPOSITION AND METHOD FOR MODIFYING SURFACE OF SUBSTRATE USING THE SAME DONGJIN SEMICHEM CO., LTD. (KR) 2022-08-18 — — US claimed
US-20220189767-A1 FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS VERSUM MATERIALS US, LLC (US) 2022-06-16 — — US claimed
US-20210363639-A1 COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS VERSUM MATERIALS US, LLC (US) 2021-11-25 — — US claimed
WO-2005034194-A2 REPAIRING DAMAGE TO LOW-K DIELECTRIC MATERIALS USING SILYLATING AGENTS HONEYWELL INTERNATIONAL INC. (US) 2005-04-14 — — WO claimed
US-6770572-B1 Use of multifunctional si-based oligomer/polymer for the surface modification of nanoporous silica films ALLIEDSIGNAL INC. 2004-08-03 — — US claimed
JP-2004513503-A — — 2004-04-30 — — JP claimed
US-6518205-B1 Multifunctional reagents for the surface modification of nanoporous silica films ALLIEDSIGNAL INC. 2003-02-11 — — US claimed
CN-1345464-A Application of multifunctional silicon-based oligomer/polymer nano-pore silica film in surface modification ALLIED SIGNAL INC (US) 2002-04-17 — — CN claimed
US-20020001973-A1 Use of multifunctional si-based oligomer/polymer for the surface modification of nanoporous silica films WU HUI-JUNG (US) 2002-01-03 — — US claimed
EP-1153426-A1 USE OF MULTIFUNCTIONAL SI-BASED OLIGOMER/POLYMER FOR THE SURFACE MODIFICATION OF NANOPOROUS SILICA FILMS AlliedSignal Inc. (US) 2001-11-14 — — EP claimed
US-6208014-B1 HYDROPHOBIC DIELECTRIC FILM PRODUCED BY REACTING A HYDROPHILIC SILICA FILM WITH A MULTIFUNCTIONAL SURFACE MODIFICATION AGENT THAT IS CAPABLE OF SILYLATING OR CAPPING SILANOL MOIETIES ON HYDROPHILIC SURFACES ALLIEDSIGNAL, INC. 2001-03-27 — — US claimed
EP-0667562-B1 Charge injection barrier for positive charging organic photoconductor HEWLETT PACKARD CO (US) 2001-03-21 — — EP claimed
WO-2000044036-A1 USE OF MULTIFUNCTIONAL SI-BASED OLIGOMER/POLYMER FOR THE SURFACE MODIFICATION OF NANOPOROUS SILICA FILMS ALLIEDSIGNAL INC. (US) 2000-07-27 — — WO claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11649547-B2 Deposition of carbon doped silicon oxide ESRRG, ESRRB, DNMT3B MEN1 2610/4885KMT2A 270/4885HTT 4729/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.