⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9055813 | 0.79 | — | — | |
| SCHEMBL19772531 | 0.77 | MEN1 (0.42) | — | |
| SCHEMBL11640069 | 0.77 | — | — | |
| SCHEMBL20221260 | 0.77 | — | — | |
| SCHEMBL17749047 | 0.75 | MEN1 (0.41) | — | |
| SCHEMBL11559618 | 0.75 | MEN1 (0.41) | — | |
| SCHEMBL2342947 | 0.74 | — | — | |
| Acetonitrile SCHEMBL28424908 | 0.74 | EPHX1 (0.34) | — | |
| SCHEMBL11640072 | 0.74 | — | — | |
| SCHEMBL13571315 | 0.73 | CTSS (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240190855-A1 | CDK INHIBITORS AND METHODS OF USE THEREOF | RELAY THERAPEUTICS, INC. | 2024-06-13 | — | — | US | disclosed |
| WO-2024048436-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | 富士フイルム株式会社 | 2024-03-07 | — | — | WO | disclosed |
| CN-112679373-B | Environment-friendly clean production process of D, L-alanine | 天宝动物营养科技股份有限公司 | 2023-07-21 | — | — | CN | disclosed |
| WO-2020009087-A1 | PHOTOSENSITIVE RESIN COMPOSITION | 日本化薬株式会社 | 2020-01-09 | — | — | WO | disclosed |
| EP-3072886-B1 | PYRIDIN-2-AMIDES USEFUL AS CB2 AGONISTS | HOFFMANN LA ROCHE (CH) | 2018-04-18 | — | — | EP | disclosed |
| EP-3165220-A1 | PHARMACEUTICAL COMPOSITION CONTAINING AN ANTI-NUCLEATING AGENT | Merck Sharp & Dohme Corp. (US) | 2017-05-10 | — | — | EP | disclosed |
| EP-2718266-B9 | PYRIDIN-2-AMIDES USEFUL AS CB2 AGONISTS | HOFFMANN LA ROCHE (CH) | 2016-09-28 | — | — | EP | disclosed |
| EP-3072886-A1 | PYRIDIN-2-AMIDES USEFUL AS CB2 AGONISTS | F. Hoffmann-La Roche AG (CH) | 2016-09-28 | — | — | EP | disclosed |
| EP-2718266-B1 | PYRIDIN-2-AMIDES USEFUL AS CB2 AGONISTS | HOFFMANN LA ROCHE (CH) | 2016-05-25 | — | — | EP | disclosed |
| US-20160137606-A1 | NOVEL PYRIDINE DERIVATIVES | HOFFMANN LA ROCHE (US) | 2016-05-19 | — | — | US | disclosed |
| US-8778596-B2 | Photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| EP-2718266-A1 | PYRIDIN- 2 -AMIDES USEFUL AS CB2 AGONISTS | F.HOFFMANN-LA ROCHE AG (CH) | 2014-04-16 | — | — | EP | disclosed |
| US-8697332-B2 | Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20130309607-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-11-21 | — | — | US | disclosed |
| US-8476444-B2 | Base generator | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| WO-2012168350-A1 | PYRIDIN- 2 -AMIDES USEFUL AS CB2 AGONISTS | F. HOFFMANN-LA ROCHE AG (CH) | 2012-12-13 | — | — | WO | disclosed |
| US-20120316147-A1 | NOVEL PYRIDINE DERIVATIVES | F. HOFFMANN-LA ROCHE AG (CH) | 2012-12-13 | — | — | US | disclosed |
| US-20120183751-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120070781-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20110086311-A1 | BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-04-14 | — | — | US | disclosed |