Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC9A1 | P19634 | 8/20 | 0.70 |
| ▸ | EGLN3 | Q9H6Z9 | 2/20 | 0.61 |
| ▸ | RAB9A | P51151 | 3/20 | 0.60 |
| ▸ | MAPT | P10636 | 2/20 | 0.60 |
| ▸ | NPC1 | O15118 | 2/20 | 0.60 |
| ▸ | GLA | P06280 | 1/20 | 0.58 |
| ▸ | TSHR | P16473 | 1/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.55 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.54 |
| ▸ | KCNMA1 | Q12791 | 1/20 | 0.53 |
| ▸ | MGAM | O43451 | 1/20 | 0.51 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.51 |
| ▸ | GAA | P10253 | 1/20 | 0.51 |
| ▸ | SI | P14410 | 1/20 | 0.51 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.51 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.51 |
| ▸ | RPS6KA3 | P51812 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29482278 | 1.00 | SLC9A1 (0.70) | SLC9A1EGLN3RAB9AMAPTNPC1 | |
| SCHEMBL7672509 | 0.95 | SLC9A1 (0.71) | SLC9A1EGLN3RAB9AMAPTNPC1 | |
| SCHEMBL2936169 | 0.89 | SLC9A1 (0.68) | SLC9A1EGLN3RAB9AMAPTNPC1 | |
| SCHEMBL14796568 | 0.89 | SLC9A1 (0.79) | SLC9A1EGLN3RAB9AMAPTNPC1 | |
| SCHEMBL31344211 | 0.84 | SLC9A1 (0.59) | SLC9A1EGLN3RAB9AMAPTNPC1 | |
| SCHEMBL5332501 | 0.82 | SLC9A1 (0.70) | SLC9A1EGLN3RAB9AMAPTNPC1 | |
| SCHEMBL730645 | 0.82 | SLC9A1 (0.70) | SLC9A1EGLN3RAB9AMAPTNPC1 | |
| SCHEMBL7667065 | 0.82 | SLC9A1 (0.70) | SLC9A1EGLN3RAB9AMAPTNPC1 | |
| SCHEMBL7011474 | 0.82 | SLC9A1 (0.70) | SLC9A1EGLN3RAB9AMAPTNPC1 | |
| SCHEMBL1834794 | 0.82 | SLC9A1 (1.00) | SLC9A1EGLN3RAB9AMAPTNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118256915-A | Flashing etching liquid for seed copper layer and flashing etching method for seed copper layer | 上海天承化学有限公司 | 2024-06-28 | — | — | CN | claimed |
| US-12493244-B2 | Photosensitive resin composition, photosensitive dry film, and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-09 | — | — | US | disclosed |
| EP-4050054-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | SHINETSU CHEMICAL CO (JP) | 2025-04-23 | — | — | EP | disclosed |
| CN-118256915-A | Flashing etching liquid for seed copper layer and flashing etching method for seed copper layer | 上海天承化学有限公司 | 2024-06-28 | — | — | CN | disclosed |
| US-20230305403-A1 | PATTERN FORMING METHOD, MANUFACTURING METHOD OF CIRCUIT BOARD, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230176479-A1 | NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-08 | — | — | US | disclosed |
| CN-116194845-A | Photomask, exposure method, method for producing resin pattern, and method for producing photomask | 富士胶片株式会社 | 2023-05-30 | — | — | CN | disclosed |
| WO-2023090253-A1 | LAMINATE, METHOD FOR PRODUCING SAME, AND ELECTRONIC DEVICE | 富士フイルム株式会社 | 2023-05-25 | — | — | WO | disclosed |
| CN-116149141-A | Method for producing resin pattern, method for producing conductive pattern, and laminate | 富士胶片株式会社 | 2023-05-23 | — | — | CN | disclosed |
| CN-116149136-A | Photosensitive composition, laminate, pattern forming method, and patterned laminate | 富士胶片株式会社 | 2023-05-23 | — | — | CN | disclosed |
| US-9519217-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-13 | — | — | US | disclosed |
| WO-2016081364-A1 | FUSED IMIDAZOLE DERIVATIVES AS TGF-BETA INHIBITORS | RIGEL PHARMACEUTICALS, INC. (US) | 2016-05-26 | — | — | WO | disclosed |
| CN-105301905-A | Chemically amplified positive resist composition and patterning process | SHINETSU CHEMICAL CO | 2016-02-03 | — | — | CN | disclosed |
| EP-2955576-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-12-16 | — | — | EP | disclosed |
| US-20150355543-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-10 | — | — | US | disclosed |
| US-8980525-B2 | Chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-17 | — | — | US | disclosed |
| US-20130026044-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-31 | — | — | US | disclosed |
| EP-2551722-A1 | Chemically amplified positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-01-30 | — | — | EP | disclosed |
| US-6476021-B1 | Compounds having cGMP-PDE inhibitory effect | MOCHIDA PHARMACEUTICAL CO., LTD. (JP) | 2002-11-05 | — | — | US | disclosed |
| EP-1048666-A1 | NOVEL COMPOUNDS HAVING cGMP-PDE INHIBITORY EFFECT | MOCHIDA PHARMACEUTICAL CO., LTD. (JP) | 2000-11-02 | — | — | EP | disclosed |