SCHEMBL7668041

SCHEMBL7668041

C=C(C)C(=O)OC1(CC)C[Si](C)(C)C(C)[Si](C)(C)C1.C=C(C)C(=O)OC1C2CC3C(=O)OC1C3C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7670612 0.90
SCHEMBL7665290 0.86
SCHEMBL7670497 0.85
SCHEMBL7673663 0.82
SCHEMBL7667130 0.82
SCHEMBL22840948 0.81 KDM4E (0.31)
SCHEMBL13088042 0.81 KDM4E (0.31)
SCHEMBL47307 0.81 KDM4E (0.31)
SCHEMBL15166539 0.81 KDM4E (0.31)
SCHEMBL19719271 0.81 KDM4E (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6492089-B2 POLYMER BEARING CYCLIC SILICON-CONTAINING GROUPS SUCH AS 1,4,4-TRIMETHYL-4-SILACYCLOHEXYL METHACRYLATE; USE AS CHEMICALLY AMPLIFIED POSITIVE RESIST SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-12-10 US disclosed
US-20010003772-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICDL CO., LTD. OF (JP) 2001-06-14 US disclosed